Rubidium and Cesium Ion-Induced Electron and Ion Signals for Scanning Ion Microscopy Applications

Yang Li; Sheng Xu; Thomas H. Loeber; Edgar J.D. Vredenbregt

doi:10.1093/mam/ozae087

Rubidium and Cesium Ion-Induced Electron and Ion Signals for Scanning Ion Microscopy Applications

Yang Li
, Sheng Xu
, Thomas H. Loeber
, Edgar J.D. Vredenbregt (Corresponding author)

Research output: Contribution to journal › Article › Academic › peer-review

4 Citations (Scopus)

Abstract

Scanning ion microscopy applications of novel focused ion beam (FIB) systems based on ultracold rubidium (Rb) and cesium (Cs) atoms were investigated via ion-induced electron and ion yields. Results measured on the Rb+ and Cs+ FIB systems were compared with results from commercially available gallium (Ga+) FIB systems to verify the merits of applying Rb+ and Cs+ for imaging. The comparison shows that Rb+ and Cs+ have higher secondary electron (SE) yields on a variety of pure element targets than Ga+, which implies a higher signal-to-noise ratio can be achieved for the same dose in SE imaging using Rb+/Cs+ than Ga+. In addition, analysis of the ion-induced ion signals reveals that secondary ions dominate Cs+ induced ion signals while the Rb+/Ga+ induced signals contain more backscattered ions.

Original language	English
Pages (from-to)	817-824
Number of pages	8
Journal	Microscopy and Microanalysis
Volume	30
Issue number	5
DOIs	https://doi.org/10.1093/mam/ozae087
Publication status	Published - Oct 2024

Bibliographical note

© The Author(s) 2024. Published by Oxford University Press on behalf of the Microscopy Society of America. All rights reserved. For commercial re-use, please contact [email protected] for reprints and translation rights for reprints. All other permissions can be obtained through our RightsLink service via the Permissions link on the article page on our site—for further information please contact [email protected].

Funding

The authors are (partly) members of the FIT4NANO COST Action CA19140. This work is part of the project Next-Generation Focused Ion Beam with file number NWO-TTW16178 of the research program Applied and Engineering Sciences (TTW), which is (partly) financed by the Dutch Research Council (NWO). This work is part of the project Next-Generation Focused Ion Beam with file number NWO-TTW16178 of the research program Applied and Engineering Sciences (TTW), which is (partly) financed by the Dutch Research Council (NWO).

Funders	Funder number
Nederlandse Organisatie voor Wetenschappelijk Onderzoek
European Cooperation in Science and Technology	NWO-TTW16178
European Cooperation in Science and Technology

Keywords

alkali metal ions
focused ion beam
scanning ion microscopy

Access to Document

10.1093/mam/ozae087

Cite this

@article{ed088645837145fea9020bfa94f66f30,

title = "Rubidium and Cesium Ion-Induced Electron and Ion Signals for Scanning Ion Microscopy Applications",

abstract = "Scanning ion microscopy applications of novel focused ion beam (FIB) systems based on ultracold rubidium (Rb) and cesium (Cs) atoms were investigated via ion-induced electron and ion yields. Results measured on the Rb+ and Cs+ FIB systems were compared with results from commercially available gallium (Ga+) FIB systems to verify the merits of applying Rb+ and Cs+ for imaging. The comparison shows that Rb+ and Cs+ have higher secondary electron (SE) yields on a variety of pure element targets than Ga+, which implies a higher signal-to-noise ratio can be achieved for the same dose in SE imaging using Rb+/Cs+ than Ga+. In addition, analysis of the ion-induced ion signals reveals that secondary ions dominate Cs+ induced ion signals while the Rb+/Ga+ induced signals contain more backscattered ions.",

keywords = "alkali metal ions, focused ion beam, scanning ion microscopy",

author = "Yang Li and Sheng Xu and Loeber, \{Thomas H.\} and Vredenbregt, \{Edgar J.D.\}",

note = "{\textcopyright} The Author(s) 2024. Published by Oxford University Press on behalf of the Microscopy Society of America. All rights reserved. For commercial re-use, please contact [email protected] for reprints and translation rights for reprints. All other permissions can be obtained through our RightsLink service via the Permissions link on the article page on our site—for further information please contact [email protected].",

year = "2024",

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doi = "10.1093/mam/ozae087",

language = "English",

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AU - Li, Yang

AU - Xu, Sheng

AU - Loeber, Thomas H.

AU - Vredenbregt, Edgar J.D.

N1 - © The Author(s) 2024. Published by Oxford University Press on behalf of the Microscopy Society of America. All rights reserved. For commercial re-use, please contact [email protected] for reprints and translation rights for reprints. All other permissions can be obtained through our RightsLink service via the Permissions link on the article page on our site—for further information please contact [email protected].

PY - 2024/10

Y1 - 2024/10

N2 - Scanning ion microscopy applications of novel focused ion beam (FIB) systems based on ultracold rubidium (Rb) and cesium (Cs) atoms were investigated via ion-induced electron and ion yields. Results measured on the Rb+ and Cs+ FIB systems were compared with results from commercially available gallium (Ga+) FIB systems to verify the merits of applying Rb+ and Cs+ for imaging. The comparison shows that Rb+ and Cs+ have higher secondary electron (SE) yields on a variety of pure element targets than Ga+, which implies a higher signal-to-noise ratio can be achieved for the same dose in SE imaging using Rb+/Cs+ than Ga+. In addition, analysis of the ion-induced ion signals reveals that secondary ions dominate Cs+ induced ion signals while the Rb+/Ga+ induced signals contain more backscattered ions.

AB - Scanning ion microscopy applications of novel focused ion beam (FIB) systems based on ultracold rubidium (Rb) and cesium (Cs) atoms were investigated via ion-induced electron and ion yields. Results measured on the Rb+ and Cs+ FIB systems were compared with results from commercially available gallium (Ga+) FIB systems to verify the merits of applying Rb+ and Cs+ for imaging. The comparison shows that Rb+ and Cs+ have higher secondary electron (SE) yields on a variety of pure element targets than Ga+, which implies a higher signal-to-noise ratio can be achieved for the same dose in SE imaging using Rb+/Cs+ than Ga+. In addition, analysis of the ion-induced ion signals reveals that secondary ions dominate Cs+ induced ion signals while the Rb+/Ga+ induced signals contain more backscattered ions.

KW - alkali metal ions

KW - focused ion beam

KW - scanning ion microscopy

UR - https://www.scopus.com/pages/publications/85208513554

U2 - 10.1093/mam/ozae087

DO - 10.1093/mam/ozae087

M3 - Article

C2 - 39255067

SN - 1431-9276

VL - 30

SP - 817

EP - 824

JO - Microscopy and Microanalysis

JF - Microscopy and Microanalysis

IS - 5

ER -

Rubidium and Cesium Ion-Induced Electron and Ion Signals for Scanning Ion Microscopy Applications

Abstract

Bibliographical note

Funding

Keywords

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