Roughness evolution of high-rate deposited a-SiNx:H films studied by atomic force microscopy and real time spectroscopic ellipsometry

P.J. Oever, van den; M.C.M. Sanden, van de; W.M.M. Kessels

Roughness evolution of high-rate deposited a-SiNx:H films studied by atomic force microscopy and real time spectroscopic ellipsometry

P.J. Oever, van den, M.C.M. Sanden, van de, W.M.M. Kessels

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

Original language	English
Title of host publication	Amorphous and nanocrystalline silicon science and technology
Editors	J.R. Abelson
Place of Publication	Warrendale, Pa
Publisher	Materials Research Society
Pages	233-238
ISBN (Print)	1-558-99758-X
Publication status	Published - 2004
Event	2004 MRS Spring Meeting & Exhibit - San Francisco, United States Duration: 13 Apr 2004 → 16 Apr 2004 https://www.mrs.org/spring2004

Publication series

Name	Materials Research Society Symposium Proceedings
Volume	808
ISSN (Print)	0272-9172

Conference

Conference	2004 MRS Spring Meeting & Exhibit
Country/Territory	United States
City	San Francisco
Period	13/04/04 → 16/04/04
Internet address	https://www.mrs.org/spring2004

Cite this

Oever, van den, P. J., Sanden, van de, M. C. M., & Kessels, W. M. M. (2004). Roughness evolution of high-rate deposited a-SiNx:H films studied by atomic force microscopy and real time spectroscopic ellipsometry. In J. R. Abelson (Ed.), Amorphous and nanocrystalline silicon science and technology (pp. 233-238). (Materials Research Society Symposium Proceedings; Vol. 808). Materials Research Society.

Oever, van den, P.J. ; Sanden, van de, M.C.M. ; Kessels, W.M.M. / Roughness evolution of high-rate deposited a-SiNx:H films studied by atomic force microscopy and real time spectroscopic ellipsometry. Amorphous and nanocrystalline silicon science and technology. editor / J.R. Abelson. Warrendale, Pa : Materials Research Society, 2004. pp. 233-238 (Materials Research Society Symposium Proceedings).

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title = "Roughness evolution of high-rate deposited a-SiNx:H films studied by atomic force microscopy and real time spectroscopic ellipsometry",

author = "{Oever, van den}, P.J. and {Sanden, van de}, M.C.M. and W.M.M. Kessels",

year = "2004",

language = "English",

isbn = "1-558-99758-X",

series = "Materials Research Society Symposium Proceedings",

publisher = "Materials Research Society",

pages = "233--238",

editor = "J.R. Abelson",

booktitle = "Amorphous and nanocrystalline silicon science and technology",

address = "United States",

note = "2004 MRS Spring Meeting & Exhibit ; Conference date: 13-04-2004 Through 16-04-2004",

url = "https://www.mrs.org/spring2004",

}

Oever, van den, PJ, Sanden, van de, MCM & Kessels, WMM 2004, Roughness evolution of high-rate deposited a-SiNx:H films studied by atomic force microscopy and real time spectroscopic ellipsometry. in JR Abelson (ed.), Amorphous and nanocrystalline silicon science and technology. Materials Research Society Symposium Proceedings, vol. 808, Materials Research Society, Warrendale, Pa, pp. 233-238, 2004 MRS Spring Meeting & Exhibit, San Francisco, California, United States, 13/04/04.

Roughness evolution of high-rate deposited a-SiNx:H films studied by atomic force microscopy and real time spectroscopic ellipsometry. / Oever, van den, P.J.; Sanden, van de, M.C.M.; Kessels, W.M.M.
Amorphous and nanocrystalline silicon science and technology. ed. / J.R. Abelson. Warrendale, Pa: Materials Research Society, 2004. p. 233-238 (Materials Research Society Symposium Proceedings; Vol. 808).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

TY - GEN

T1 - Roughness evolution of high-rate deposited a-SiNx:H films studied by atomic force microscopy and real time spectroscopic ellipsometry

AU - Oever, van den, P.J.

AU - Sanden, van de, M.C.M.

AU - Kessels, W.M.M.

PY - 2004

Y1 - 2004

M3 - Conference contribution

SN - 1-558-99758-X

T3 - Materials Research Society Symposium Proceedings

SP - 233

EP - 238

BT - Amorphous and nanocrystalline silicon science and technology

A2 - Abelson, J.R.

PB - Materials Research Society

CY - Warrendale, Pa

T2 - 2004 MRS Spring Meeting & Exhibit

Y2 - 13 April 2004 through 16 April 2004

ER -

Oever, van den PJ, Sanden, van de MCM , Kessels WMM. Roughness evolution of high-rate deposited a-SiNx:H films studied by atomic force microscopy and real time spectroscopic ellipsometry. In Abelson JR, editor, Amorphous and nanocrystalline silicon science and technology. Warrendale, Pa: Materials Research Society. 2004. p. 233-238. (Materials Research Society Symposium Proceedings).