Roughness evolution of high-rate deposited a-SiNx:H films studied by atomic force microscopy and real time spectroscopic ellipsometry

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

Original languageEnglish
Title of host publicationAmorphous and nanocrystalline silicon science and technology
EditorsJ.R. Abelson
Place of PublicationWarrendale, Pa
PublisherMaterials Research Society
ISBN (Print)1-558-99758-X
Publication statusPublished - 2004
Event2004 MRS Spring Meeting & Exhibit - San Francisco, United States
Duration: 13 Apr 200416 Apr 2004

Publication series

NameMaterials Research Society Symposium Proceedings
ISSN (Print)0272-9172


Conference2004 MRS Spring Meeting & Exhibit
Country/TerritoryUnited States
CitySan Francisco
Internet address

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