Roughness evolution of high-rate deposited a-SiNx:H films studied by atomic force microscopy and real time spectroscopic ellipsometry

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

Original languageEnglish
Title of host publicationAmorphous and nanocrystalline silicon science and technology
EditorsJ.R. Abelson
Place of PublicationWarrendale, Pa
PublisherMaterials Research Society
Pages233-238
ISBN (Print)1-558-99758-X
Publication statusPublished - 2004
EventAmorphous and Nanocrystalline Silicon Science and Technology - San Francisco, United States
Duration: 13 Apr 200416 Apr 2004

Publication series

NameMaterials Research Society Symposium Proceedings
Volume808
ISSN (Print)0272-9172

Conference

ConferenceAmorphous and Nanocrystalline Silicon Science and Technology
CountryUnited States
CitySan Francisco
Period13/04/0416/04/04
OtherSymposium held at the 2004 MRS Spring Meeting

Cite this