Room-temperature and low-pressure nanoimprint lithography

A. Lebib, Y. Chen, E. Cambril, P. Youinou, V. Studer, M. Natali, A. Pepin, H.M. Janssen, R.P. Sijbesma

Research output: Contribution to journalArticleAcademicpeer-review

46 Citations (Scopus)
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Abstract

We demonstrate that room-temperature and low-pressure nanoimprint lithography techniques can be achieved by using Hybrane HS2550, a semi-crystalline hyperbranched resist polymer with a glass transition temperature below and a melting point above room temperature. Nanoimprint lithography at room temperature is possible with sub-100 nm resolution, as 75 nm line-and-spacing gratings were successfully fabricated with a tri-layer process and a metal lift-off. The melt viscosity of Hybrane HS2550 decreases drastically with temperature allowing nanoimprint experiments at low pressures, while maintaining imprint temperatures that are much lower than commonly required in nanoimprint technology.
Original languageEnglish
Pages (from-to)371-377
JournalMicroelectronic Engineering
Volume61-62
DOIs
Publication statusPublished - 2002

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