Role of Fluorine in a Chlorine-Based Reactive Ion Etching of Semiconductors

F. Karouta; B. Jacobs; M.C.J.C.M. Krämer

Role of Fluorine in a Chlorine-Based Reactive Ion Etching of Semiconductors

F. Karouta
, B. Jacobs
, M.C.J.C.M. Krämer

Photonic Integration

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

Original language	English
Title of host publication	Proceedings of the. Conference on Semiconductors and Integrated Opto-Electronics (SIOE 2001), 9-11 april 2001, Cardiff Wales
Place of Publication	Cardiff
Publisher	University of Wales
Publication status	Published - 2001
Event	2001 Conference on Semiconductor and Integrated OptoElectronics (SIOE '01), April 9-11, 2001, Cardiff, UK - Cardiff, United Kingdom Duration: 9 Apr 2001 → 11 Apr 2001

Conference

Conference	2001 Conference on Semiconductor and Integrated OptoElectronics (SIOE '01), April 9-11, 2001, Cardiff, UK
Abbreviated title	SIOE '01
Country/Territory	United Kingdom
City	Cardiff
Period	9/04/01 → 11/04/01

Cite this

@inproceedings{6ec1b1a5f2c249fdab1d26c64bec6f9b,

title = "Role of Fluorine in a Chlorine-Based Reactive Ion Etching of Semiconductors",

author = "F. Karouta and B. Jacobs and M.C.J.C.M. Kr{\"a}mer",

year = "2001",

language = "English",

booktitle = "Proceedings of the. Conference on Semiconductors and Integrated Opto-Electronics (SIOE 2001), 9-11 april 2001, Cardiff Wales",

publisher = "University of Wales",

note = "2001 Conference on Semiconductor and Integrated OptoElectronics (SIOE '01), April 9-11, 2001, Cardiff, UK, SIOE '01 ; Conference date: 09-04-2001 Through 11-04-2001",

}

Karouta, F, Jacobs, B & Krämer, MCJCM 2001, Role of Fluorine in a Chlorine-Based Reactive Ion Etching of Semiconductors. in Proceedings of the. Conference on Semiconductors and Integrated Opto-Electronics (SIOE 2001), 9-11 april 2001, Cardiff Wales. University of Wales, Cardiff, 2001 Conference on Semiconductor and Integrated OptoElectronics (SIOE '01), April 9-11, 2001, Cardiff, UK, Cardiff, United Kingdom, 9/04/01.

Role of Fluorine in a Chlorine-Based Reactive Ion Etching of Semiconductors. / Karouta, F.; Jacobs, B.; Krämer, M.C.J.C.M.
Proceedings of the. Conference on Semiconductors and Integrated Opto-Electronics (SIOE 2001), 9-11 april 2001, Cardiff Wales. Cardiff: University of Wales, 2001.

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

TY - GEN

T1 - Role of Fluorine in a Chlorine-Based Reactive Ion Etching of Semiconductors

AU - Karouta, F.

AU - Jacobs, B.

AU - Krämer, M.C.J.C.M.

PY - 2001

Y1 - 2001

M3 - Conference contribution

BT - Proceedings of the. Conference on Semiconductors and Integrated Opto-Electronics (SIOE 2001), 9-11 april 2001, Cardiff Wales

PB - University of Wales

CY - Cardiff

T2 - 2001 Conference on Semiconductor and Integrated OptoElectronics (SIOE '01), April 9-11, 2001, Cardiff, UK

Y2 - 9 April 2001 through 11 April 2001

ER -