Robust synchronization of motion in wafer scanners using particle swarm optimization

Vincent A. Looijen; Marcel F. Heertjes

doi:10.1109/CCTA.2018.8511380

Robust synchronization of motion in wafer scanners using particle swarm optimization

Vincent A. Looijen
, Marcel F. Heertjes

Dynamics and Control

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

11 Citations (Scopus)

2 Downloads (Pure)

Abstract

For synchronization of high-precision motion stages, in particular a wafer and a reticle stage combination of an industrial wafer scanner, a centralized controller is optimized using both time- and frequency-domain data. The resulting multi-variable controller, which is designed using a sequential loop closing approach, transmits both the error from wafer-to-reticle as well as from reticle-to-wafer stage. The controller is designed to minimize the synchronization error occurring between the otherwise decentralized control loops of both stage systems. The controller tuning is performed using off-line particle swarm optimization and combines time-domain performance specifications with frequency-domain robustness constraints. The optimized controller demonstrates improved synchronization performance which follows from measurement results obtained from an industrial wafer scanner.

Original language	English
Title of host publication	2018 IEEE Conference on Control Technology and Applications, CCTA 2018
Place of Publication	Piscataway
Publisher	Institute of Electrical and Electronics Engineers
Pages	1102-1107
Number of pages	6
ISBN (Electronic)	978-1-5386-7698-1
ISBN (Print)	978-1-5386-7699-8
DOIs	https://doi.org/10.1109/CCTA.2018.8511380
Publication status	Published - 26 Oct 2018
Event	2nd IEEE Conference on Control Technology and Applications, CCTA 2018 - Copenhagen, Denmark Duration: 21 Aug 2018 → 24 Aug 2018 Conference number: 2 http://ccta2018.ieeecss.org/

Conference

Conference	2nd IEEE Conference on Control Technology and Applications, CCTA 2018
Abbreviated title	CCTA 2018
Country/Territory	Denmark
City	Copenhagen
Period	21/08/18 → 24/08/18
Internet address	http://ccta2018.ieeecss.org/

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10.1109/CCTA.2018.8511380

Cite this

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title = "Robust synchronization of motion in wafer scanners using particle swarm optimization",

abstract = "For synchronization of high-precision motion stages, in particular a wafer and a reticle stage combination of an industrial wafer scanner, a centralized controller is optimized using both time- and frequency-domain data. The resulting multi-variable controller, which is designed using a sequential loop closing approach, transmits both the error from wafer-to-reticle as well as from reticle-to-wafer stage. The controller is designed to minimize the synchronization error occurring between the otherwise decentralized control loops of both stage systems. The controller tuning is performed using off-line particle swarm optimization and combines time-domain performance specifications with frequency-domain robustness constraints. The optimized controller demonstrates improved synchronization performance which follows from measurement results obtained from an industrial wafer scanner.",

author = "Looijen, \{Vincent A.\} and Heertjes, \{Marcel F.\}",

year = "2018",

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doi = "10.1109/CCTA.2018.8511380",

language = "English",

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booktitle = "2018 IEEE Conference on Control Technology and Applications, CCTA 2018",

publisher = "Institute of Electrical and Electronics Engineers",

address = "United States",

note = "2nd IEEE Conference on Control Technology and Applications, CCTA 2018, CCTA 2018 ; Conference date: 21-08-2018 Through 24-08-2018",

url = "http://ccta2018.ieeecss.org/",

}

Looijen, VA & Heertjes, MF 2018, Robust synchronization of motion in wafer scanners using particle swarm optimization. in 2018 IEEE Conference on Control Technology and Applications, CCTA 2018., 8511380, Institute of Electrical and Electronics Engineers, Piscataway, pp. 1102-1107, 2nd IEEE Conference on Control Technology and Applications, CCTA 2018, Copenhagen, Denmark, 21/08/18. https://doi.org/10.1109/CCTA.2018.8511380

Robust synchronization of motion in wafer scanners using particle swarm optimization. / Looijen, Vincent A.; Heertjes, Marcel F.
2018 IEEE Conference on Control Technology and Applications, CCTA 2018. Piscataway: Institute of Electrical and Electronics Engineers, 2018. p. 1102-1107 8511380.

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

TY - GEN

T1 - Robust synchronization of motion in wafer scanners using particle swarm optimization

AU - Looijen, Vincent A.

AU - Heertjes, Marcel F.

N1 - Conference code: 2

PY - 2018/10/26

Y1 - 2018/10/26

N2 - For synchronization of high-precision motion stages, in particular a wafer and a reticle stage combination of an industrial wafer scanner, a centralized controller is optimized using both time- and frequency-domain data. The resulting multi-variable controller, which is designed using a sequential loop closing approach, transmits both the error from wafer-to-reticle as well as from reticle-to-wafer stage. The controller is designed to minimize the synchronization error occurring between the otherwise decentralized control loops of both stage systems. The controller tuning is performed using off-line particle swarm optimization and combines time-domain performance specifications with frequency-domain robustness constraints. The optimized controller demonstrates improved synchronization performance which follows from measurement results obtained from an industrial wafer scanner.

AB - For synchronization of high-precision motion stages, in particular a wafer and a reticle stage combination of an industrial wafer scanner, a centralized controller is optimized using both time- and frequency-domain data. The resulting multi-variable controller, which is designed using a sequential loop closing approach, transmits both the error from wafer-to-reticle as well as from reticle-to-wafer stage. The controller is designed to minimize the synchronization error occurring between the otherwise decentralized control loops of both stage systems. The controller tuning is performed using off-line particle swarm optimization and combines time-domain performance specifications with frequency-domain robustness constraints. The optimized controller demonstrates improved synchronization performance which follows from measurement results obtained from an industrial wafer scanner.

UR - https://www.scopus.com/pages/publications/85056879337

U2 - 10.1109/CCTA.2018.8511380

DO - 10.1109/CCTA.2018.8511380

M3 - Conference contribution

AN - SCOPUS:85056879337

SN - 978-1-5386-7699-8

SP - 1102

EP - 1107

BT - 2018 IEEE Conference on Control Technology and Applications, CCTA 2018

PB - Institute of Electrical and Electronics Engineers

CY - Piscataway

T2 - 2nd IEEE Conference on Control Technology and Applications, CCTA 2018

Y2 - 21 August 2018 through 24 August 2018

ER -

Robust synchronization of motion in wafer scanners using particle swarm optimization

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