Abstract
no abstract
| Original language | English |
|---|---|
| Pages (from-to) | 278-278 |
| Journal | Journal of Colloid and Interface Science |
| Volume | 242 |
| Issue number | 1 |
| DOIs | |
| Publication status | Published - 1 Oct 2001 |
Response to Comments by M. Kosmulski on “The Electroviscous Behavior of Dispersions of Amorphous Silica (Ludox) in KCl Solutions” by J. Laven and H. N. Stein
J. Laven, H.N. Stein
Research output: Contribution to journal › Article › Academic › peer-review
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