Response to Comments by M. Kosmulski on “The Electroviscous Behavior of Dispersions of Amorphous Silica (Ludox) in KCl Solutions” by J. Laven and H. N. Stein

J. Laven, H.N. Stein

Research output: Contribution to journalArticleAcademicpeer-review

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Abstract

no abstract
Original languageEnglish
Pages (from-to)278-278
JournalJournal of Colloid and Interface Science
Volume242
Issue number1
DOIs
Publication statusPublished - 1 Oct 2001

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