Remote silane plasma chemistry effects and their correlation with a-Si:H film properties

W.M.M. Kessels; A.H.M. Smets; B.A. Korevaar; G.J. Adriaenssens; M.C.M. Van De Sanden; D.C. Schram

Remote silane plasma chemistry effects and their correlation with a-Si:H film properties

W.M.M. Kessels, A.H.M. Smets, B.A. Korevaar, G.J. Adriaenssens, M.C.M. Van De Sanden, D.C. Schram

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

17 Citations (Scopus)

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Abstract

A remote silane plasma, capable of depositing solar grade a-Si:H at a rate of 10 nm/s and with an up to ten times higher hole drift mobility than standard a-Si:H, has been investigated by means of several plasma diagnostics. The creation of the different reactive species in the plasma and their contribution to film growth has been analyzed and is correlated with the film properties obtained under various conditions. Furthermore, the first results on a n-i-p solar cell with the intrinsic a-Si:H film deposited by this remote plasma are presented.

Original language	English
Title of host publication	Amorphous and heterogeneous silicon thin films : fundamentals to devices - 1999 : symposium held April 5-9, 1999, San Francisco, California, U.S.A.
Editors	H.M. Branz
Place of Publication	Warrendale
Publisher	Materials Research Society
Pages	25-30
Number of pages	6
ISBN (Print)	1-55899-464-5
Publication status	Published - 1 Dec 1999
Event	1999 MRS Spring Meeting & Exhibit - San Francisco, United States Duration: 5 Apr 1999 → 9 Apr 1999 https://www.mrs.org/spring1999

Publication series

Name	Materials Research Society Symposium - Proceedings
Volume	557
ISSN (Print)	0272-9172

Conference

Conference	1999 MRS Spring Meeting & Exhibit
Country/Territory	United States
City	San Francisco
Period	5/04/99 → 9/04/99
Internet address	https://www.mrs.org/spring1999

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Kessels, W. M. M., Smets, A. H. M., Korevaar, B. A., Adriaenssens, G. J., Van De Sanden, M. C. M., & Schram, D. C. (1999). Remote silane plasma chemistry effects and their correlation with a-Si:H film properties. In H. M. Branz (Ed.), Amorphous and heterogeneous silicon thin films : fundamentals to devices - 1999 : symposium held April 5-9, 1999, San Francisco, California, U.S.A. (pp. 25-30). (Materials Research Society Symposium - Proceedings; Vol. 557). Materials Research Society.

Kessels, W.M.M. ; Smets, A.H.M. ; Korevaar, B.A. et al. / Remote silane plasma chemistry effects and their correlation with a-Si:H film properties. Amorphous and heterogeneous silicon thin films : fundamentals to devices - 1999 : symposium held April 5-9, 1999, San Francisco, California, U.S.A. . editor / H.M. Branz. Warrendale : Materials Research Society, 1999. pp. 25-30 (Materials Research Society Symposium - Proceedings).

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abstract = "A remote silane plasma, capable of depositing solar grade a-Si:H at a rate of 10 nm/s and with an up to ten times higher hole drift mobility than standard a-Si:H, has been investigated by means of several plasma diagnostics. The creation of the different reactive species in the plasma and their contribution to film growth has been analyzed and is correlated with the film properties obtained under various conditions. Furthermore, the first results on a n-i-p solar cell with the intrinsic a-Si:H film deposited by this remote plasma are presented.",

author = "W.M.M. Kessels and A.H.M. Smets and B.A. Korevaar and G.J. Adriaenssens and {Van De Sanden}, M.C.M. and D.C. Schram",

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note = "1999 MRS Spring Meeting & Exhibit ; Conference date: 05-04-1999 Through 09-04-1999",

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Kessels, WMM, Smets, AHM, Korevaar, BA, Adriaenssens, GJ, Van De Sanden, MCM & Schram, DC 1999, Remote silane plasma chemistry effects and their correlation with a-Si:H film properties. in HM Branz (ed.), Amorphous and heterogeneous silicon thin films : fundamentals to devices - 1999 : symposium held April 5-9, 1999, San Francisco, California, U.S.A. . Materials Research Society Symposium - Proceedings, vol. 557, Materials Research Society, Warrendale, pp. 25-30, 1999 MRS Spring Meeting & Exhibit, San Francisco, California, United States, 5/04/99.

Remote silane plasma chemistry effects and their correlation with a-Si:H film properties. / Kessels, W.M.M.; Smets, A.H.M.; Korevaar, B.A. et al.

Amorphous and heterogeneous silicon thin films : fundamentals to devices - 1999 : symposium held April 5-9, 1999, San Francisco, California, U.S.A. . ed. / H.M. Branz. Warrendale : Materials Research Society, 1999. p. 25-30 (Materials Research Society Symposium - Proceedings; Vol. 557).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

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AB - A remote silane plasma, capable of depositing solar grade a-Si:H at a rate of 10 nm/s and with an up to ten times higher hole drift mobility than standard a-Si:H, has been investigated by means of several plasma diagnostics. The creation of the different reactive species in the plasma and their contribution to film growth has been analyzed and is correlated with the film properties obtained under various conditions. Furthermore, the first results on a n-i-p solar cell with the intrinsic a-Si:H film deposited by this remote plasma are presented.

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M3 - Conference contribution

SN - 1-55899-464-5

T3 - Materials Research Society Symposium - Proceedings

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BT - Amorphous and heterogeneous silicon thin films : fundamentals to devices - 1999 : symposium held April 5-9, 1999, San Francisco, California, U.S.A.

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T2 - 1999 MRS Spring Meeting & Exhibit

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Kessels WMM, Smets AHM, Korevaar BA, Adriaenssens GJ, Van De Sanden MCM , Schram DC. Remote silane plasma chemistry effects and their correlation with a-Si:H film properties. In Branz HM, editor, Amorphous and heterogeneous silicon thin films : fundamentals to devices - 1999 : symposium held April 5-9, 1999, San Francisco, California, U.S.A. . Warrendale: Materials Research Society. 1999. p. 25-30. (Materials Research Society Symposium - Proceedings).

Remote silane plasma chemistry effects and their correlation with a-Si:H film properties

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