Remote plasma-enhanced metalorganic chemical vapor deposition of aluminum oxide thin films

I. Volintiru; M. Creatore; J.L. Hemmen, van; M.C.M. Sanden, van de

doi:10.1002/ppap.200700164

Remote plasma-enhanced metalorganic chemical vapor deposition of aluminum oxide thin films

I. Volintiru, M. Creatore, J.L. Hemmen, van, M.C.M. Sanden, van de

Research output: Contribution to journal › Article › Academic › peer-review

8 Citations (Scopus)

3 Downloads (Pure)

Abstract

Aluminum oxide films were deposited using remote plasma-enhanced metalorganic chemical vapor deposition from oxygen/trimethylaluminum mixtures. Initial studies by in situ spectroscopic ellipsometry demonstrated that the aluminum oxide films deposited at temperatures

Original language	English
Pages (from-to)	645-652
Number of pages	8
Journal	Plasma Processes and Polymers
Volume	5
Issue number	7
DOIs	https://doi.org/10.1002/ppap.200700164
Publication status	Published - 2008

Access to Document

10.1002/ppap.200700164

Cite this

@article{bc372aad3dd948929ae5188eda67ee84,

title = "Remote plasma-enhanced metalorganic chemical vapor deposition of aluminum oxide thin films",

abstract = "Aluminum oxide films were deposited using remote plasma-enhanced metalorganic chemical vapor deposition from oxygen/trimethylaluminum mixtures. Initial studies by in situ spectroscopic ellipsometry demonstrated that the aluminum oxide films deposited at temperatures",

author = "I. Volintiru and M. Creatore and {Hemmen, van}, J.L. and {Sanden, van de}, M.C.M.",

year = "2008",

doi = "10.1002/ppap.200700164",

language = "English",

volume = "5",

pages = "645--652",

journal = "Plasma Processes and Polymers",

issn = "1612-8850",

publisher = "Wiley-VCH Verlag",

number = "7",

}

TY - JOUR

T1 - Remote plasma-enhanced metalorganic chemical vapor deposition of aluminum oxide thin films

AU - Volintiru, I.

AU - Creatore, M.

AU - Hemmen, van, J.L.

AU - Sanden, van de, M.C.M.

PY - 2008

Y1 - 2008

N2 - Aluminum oxide films were deposited using remote plasma-enhanced metalorganic chemical vapor deposition from oxygen/trimethylaluminum mixtures. Initial studies by in situ spectroscopic ellipsometry demonstrated that the aluminum oxide films deposited at temperatures

AB - Aluminum oxide films were deposited using remote plasma-enhanced metalorganic chemical vapor deposition from oxygen/trimethylaluminum mixtures. Initial studies by in situ spectroscopic ellipsometry demonstrated that the aluminum oxide films deposited at temperatures

U2 - 10.1002/ppap.200700164

DO - 10.1002/ppap.200700164

M3 - Article

SN - 1612-8850

VL - 5

SP - 645

EP - 652

JO - Plasma Processes and Polymers

JF - Plasma Processes and Polymers

IS - 7

ER -

Remote plasma-enhanced metalorganic chemical vapor deposition of aluminum oxide thin films

Abstract

Access to Document

Fingerprint

Cite this