Remote plasma-enhanced metalorganic chemical vapor deposition of aluminum oxide thin films

I. Volintiru, M. Creatore, J.L. Hemmen, van, M.C.M. Sanden, van de

Research output: Contribution to journalArticleAcademicpeer-review

8 Citations (Scopus)

Abstract

Aluminum oxide films were deposited using remote plasma-enhanced metalorganic chemical vapor deposition from oxygen/trimethylaluminum mixtures. Initial studies by in situ spectroscopic ellipsometry demonstrated that the aluminum oxide films deposited at temperatures
Original languageEnglish
Pages (from-to)645-652
Number of pages8
JournalPlasma Processes and Polymers
Volume5
Issue number7
DOIs
Publication statusPublished - 2008

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