Remote plasma deposition of inorganic films : the influence of plasma chemistry and ion bombardment on film growth and moisture permeation barrier performances

M. Creatore, M.A. Blauw, J.L. Hemmen, van, I. Volintiru, M.M. Koetse, V.I.T.A. Lohmann, M.C.M. Sanden, van de, A. Milella, H.F.M. Schoo

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Original languageEnglish
Title of host publicationProceedings of the 10th International Conference on Plasma Surface Engineering : Conference and Exhibition (PSE 2006), September 10-15, 2006, Garmisch-Partenkirchen, Germany (Abstracts)
Place of PublicationS.l.
Publishers.n.
Pages277-277
Publication statusPublished - 2006
Eventconference; Conference and Exhibition (PSE 2006), September 10-15, 2006, Garmisch-Partenkirchen, Germany - Garmisch-Partenkirchen, Germany
Duration: 10 Sep 200615 Sep 2006

Conference

Conferenceconference; Conference and Exhibition (PSE 2006), September 10-15, 2006, Garmisch-Partenkirchen, Germany
Abbreviated titlePSE 2006
CountryGermany
CityGarmisch-Partenkirchen
Period10/09/0615/09/06
Other10th International Conference on Plasma Surface Engineering

Cite this

Creatore, M., Blauw, M. A., Hemmen, van, J. L., Volintiru, I., Koetse, M. M., Lohmann, V. I. T. A., ... Schoo, H. F. M. (2006). Remote plasma deposition of inorganic films : the influence of plasma chemistry and ion bombardment on film growth and moisture permeation barrier performances. In Proceedings of the 10th International Conference on Plasma Surface Engineering : Conference and Exhibition (PSE 2006), September 10-15, 2006, Garmisch-Partenkirchen, Germany (Abstracts) (pp. 277-277). S.l.: s.n..