Remote plasma deposition of hydrogenated amorphous silicon : plasma processes, film growth, and material properties

Research output: ThesisPhd Thesis 1 (Research TU/e / Graduation TU/e)

495 Downloads (Pure)
Original languageEnglish
QualificationDoctor of Philosophy
Awarding Institution
  • Applied Physics
Supervisors/Advisors
  • Schram, Daan C., Promotor
  • van der Weg, W.F., Promotor, External person
  • van de Sanden, M.C.M. (Richard), Copromotor
Award date13 Sep 2000
Place of PublicationEindhoven
Publisher
Print ISBNs90-386-1579-5
DOIs
Publication statusPublished - 2000

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