Remote plasma deposition of hydrogenated amorphous silicon : plasma processes, film growth, and material properties

Research output: Thesis › Phd Thesis 1 (Research TU/e / Graduation TU/e)

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Original language	English
Qualification	Doctor of Philosophy
Awarding Institution	Applied Physics
Supervisors/Advisors	Schram, Daan C., Promotor van der Weg, W.F., Promotor, External person van de Sanden, M.C.M. (Richard), Copromotor
Award date	13 Sep 2000
Place of Publication	Eindhoven
Publisher	Technische Universiteit Eindhoven
Print ISBNs	90-386-1579-5
DOIs	https://doi.org/10.6100/IR536418
Publication status	Published - 2000

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@phdthesis{0857cdbece944af889a70f29a68d61da,

title = "Remote plasma deposition of hydrogenated amorphous silicon : plasma processes, film growth, and material properties",

author = "W.M.M. Kessels",

year = "2000",

doi = "10.6100/IR536418",

language = "English",

isbn = "90-386-1579-5",

publisher = "Technische Universiteit Eindhoven",

school = "Applied Physics",

}