Remote plasma atomic layer deposition of thin films of electrochemically active LiCoO2

M.E. Donders, H.C.M. Knoops, W.M.M. Kessels, P.H.L. Notten

Research output: Contribution to journalArticleAcademicpeer-review

21 Citations (Scopus)
127 Downloads (Pure)

Abstract

One of the remaining challenges in the field of portable electronics is the miniaturization of lithium-ion batteries without decreasing their storage capacity. To tackle this challenge and to effectively integrate battery technology in even a wider variety of applications, it is essential to produce high quality thin films for all-solid-state batteries. A remote plasma ALD process for the positive electrode material LiCoO2 was developed using the combination of CoCp2 as the cobalt precursor, LiOtBu as the lithium precursor and O2 plasma as the oxidant source. The thin films were deposited at a temperature of 325 °C with a virtually linear growth rate of 0.06 nm/cycle. After annealing the samples at 700 °C for 6 minutes the high temperature phase LiCoO2 was obtained, as demonstrated by XRD and Raman spectroscopy measurements. Electrochemical charge/discharge cycling showed good electrochemical activity with a promising storage capacity.
Original languageEnglish
Pages (from-to)321-330
Number of pages10
JournalECS Transactions
Volume41
Issue number2
DOIs
Publication statusPublished - 2011

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