Release of compressive intrinsic stress in ultraclean thin nickel films as a result of adsorption of gases

M.M.P. Janssen

doi:10.1063/1.1658129

Release of compressive intrinsic stress in ultraclean thin nickel films as a result of adsorption of gases

M.M.P. Janssen

Research output: Contribution to journal › Article › Academic › peer-review

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Abstract

No abstract.

Original language	English
Pages (from-to)	3055-3056
Number of pages	2
Journal	Journal of Applied Physics
Volume	40
Issue number	7
DOIs	https://doi.org/10.1063/1.1658129
Publication status	Published - 1969

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title = "Release of compressive intrinsic stress in ultraclean thin nickel films as a result of adsorption of gases",

abstract = "No abstract.",

author = "M.M.P. Janssen",

year = "1969",

doi = "10.1063/1.1658129",

language = "English",

volume = "40",

pages = "3055--3056",

journal = "Journal of Applied Physics",

issn = "0021-8979",

publisher = "American Institute of Physics",

number = "7",

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TY - JOUR

T1 - Release of compressive intrinsic stress in ultraclean thin nickel films as a result of adsorption of gases

AU - Janssen, M.M.P.

PY - 1969

Y1 - 1969

N2 - No abstract.

AB - No abstract.

U2 - 10.1063/1.1658129

DO - 10.1063/1.1658129

M3 - Article

SN - 0021-8979

VL - 40

SP - 3055

EP - 3056

JO - Journal of Applied Physics

JF - Journal of Applied Physics

IS - 7

ER -

Release of compressive intrinsic stress in ultraclean thin nickel films as a result of adsorption of gases

Abstract

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