A reflow process for photoresist is described that aims to reduce propagation loss and static phase error in InP membrane waveguides. We demonstrate that vacuum UV exposure followed by exposure to acetone vapor smoothens the resist and significantly reduces the line edge roughness.
|Title of host publication||Proceedings of the 23rd Annual Symposium of the IEEE Photonics Society Benelux Chapter|
|Number of pages||4|
|Publication status||Published - 2018|
|Event||23rd Annual Symposium of the IEEE Photonics Society Benelux Chapter - Paleis der Academiën, Brussels, Belgium|
Duration: 15 Nov 2018 → 16 Nov 2018
|Conference||23rd Annual Symposium of the IEEE Photonics Society Benelux Chapter|
|Period||15/11/18 → 16/11/18|