Reflow of deep UV resist for line edge roughness reduction in InP membrane waveguides

J.P. van Engelen; J. Bolk; M.K. Smit; K.A. Williams; J.J.G.M. van der Tol; Y. Jiao

Reflow of deep UV resist for line edge roughness reduction in InP membrane waveguides

J.P. van Engelen, J. Bolk, M.K. Smit, K.A. Williams, J.J.G.M. van der Tol, Y. Jiao

Photonic Integration

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

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Abstract

A reflow process for photoresist is described that aims to reduce propagation loss and static phase error in InP membrane waveguides. We demonstrate that vacuum UV exposure followed by exposure to acetone vapor smoothens the resist and significantly reduces the line edge roughness.

Original language	English
Title of host publication	Proceedings of the 23rd Annual Symposium of the IEEE Photonics Society Benelux Chapter
Pages	165-168
Number of pages	4
Publication status	Published - 2018
Event	23rd Annual Symposium of the IEEE Photonics Society Benelux - Paleis der Academiën, Brussels, Belgium Duration: 15 Nov 2018 → 16 Nov 2018 Conference number: 23

Conference

Conference	23rd Annual Symposium of the IEEE Photonics Society Benelux
Country/Territory	Belgium
City	Brussels
Period	15/11/18 → 16/11/18

Cite this

@inproceedings{6a158731850e411d85258ea0e9c18a39,

title = "Reflow of deep UV resist for line edge roughness reduction in InP membrane waveguides",

abstract = "A reflow process for photoresist is described that aims to reduce propagation loss and static phase error in InP membrane waveguides. We demonstrate that vacuum UV exposure followed by exposure to acetone vapor smoothens the resist and significantly reduces the line edge roughness.",

author = "{van Engelen}, J.P. and J. Bolk and M.K. Smit and K.A. Williams and {van der Tol}, J.J.G.M. and Y. Jiao",

year = "2018",

language = "English",

pages = "165--168",

booktitle = "Proceedings of the 23rd Annual Symposium of the IEEE Photonics Society Benelux Chapter",

note = "23rd Annual Symposium of the IEEE Photonics Society Benelux ; Conference date: 15-11-2018 Through 16-11-2018",

}

TY - GEN

T1 - Reflow of deep UV resist for line edge roughness reduction in InP membrane waveguides

AU - van Engelen, J.P.

AU - Bolk, J.

AU - Smit, M.K.

AU - Williams, K.A.

AU - van der Tol, J.J.G.M.

AU - Jiao, Y.

N1 - Conference code: 23

PY - 2018

Y1 - 2018

N2 - A reflow process for photoresist is described that aims to reduce propagation loss and static phase error in InP membrane waveguides. We demonstrate that vacuum UV exposure followed by exposure to acetone vapor smoothens the resist and significantly reduces the line edge roughness.

AB - A reflow process for photoresist is described that aims to reduce propagation loss and static phase error in InP membrane waveguides. We demonstrate that vacuum UV exposure followed by exposure to acetone vapor smoothens the resist and significantly reduces the line edge roughness.

M3 - Conference contribution

SP - 165

EP - 168

BT - Proceedings of the 23rd Annual Symposium of the IEEE Photonics Society Benelux Chapter

T2 - 23rd Annual Symposium of the IEEE Photonics Society Benelux

Y2 - 15 November 2018 through 16 November 2018

ER -

Reflow of deep UV resist for line edge roughness reduction in InP membrane waveguides

Abstract

Conference

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