Reduced chemical model in microwave induced plasmas for the purpose of deposition

E.H. Kemaneci, J. Dijk, van, J.J.A.M. Mullen, van der

Research output: Contribution to conference › Poster

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Abstract

No abstract.

Poster presented at the 23th NNV-Symposium Plasma Physics & Radiation Technology, 15-16 March 2011, Lunteren, The Netherlands

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title = "Reduced chemical model in microwave induced plasmas for the purpose of deposition",

abstract = "No abstract.",

author = "E.H. Kemaneci and {Dijk, van}, J. and {Mullen, van der}, J.J.A.M.",

note = "Poster presented at the 23th NNV-Symposium Plasma Physics & Radiation Technology, 15-16 March 2011, Lunteren, The Netherlands",

year = "2011",

language = "English",

pages = "B16--",

}

TY - CONF

T1 - Reduced chemical model in microwave induced plasmas for the purpose of deposition

AU - Kemaneci, E.H.

AU - Dijk, van, J.

AU - Mullen, van der, J.J.A.M.

N1 - Poster presented at the 23th NNV-Symposium Plasma Physics & Radiation Technology, 15-16 March 2011, Lunteren, The Netherlands

PY - 2011

Y1 - 2011

N2 - No abstract.

AB - No abstract.

M3 - Poster

SP - B16-

ER -