Reduced chemical model in microwave induced plasmas for the purpose of deposition

E.H. Kemaneci, J. Dijk, van, J.J.A.M. Mullen, van der

Research output: Contribution to conferencePoster

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Abstract

No abstract.
Original languageEnglish
PagesB16-
Publication statusPublished - 2011

Bibliographical note

Poster presented at the 23th NNV-Symposium Plasma Physics & Radiation Technology, 15-16 March 2011, Lunteren, The Netherlands

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