Redeposition during ion-beam erosion can stabilize well-ordered nanostructures

C. Diddens, S.J. Linz

Research output: Contribution to journalArticleAcademicpeer-review

12 Citations (Scopus)

Abstract

Using a continuum formulation valid for arbitrary laterally two-dimensional surface profiles, we investigate the significance of redeposition of ion-beam eroded particles on spatio-temporally evolving surface morphologies of the target. Combining the effect of redeposition with standard roughening and smoothing effects of ion-beam erosion processes to a generalized nonlocal Kuramoto-Sivashinsky equation, we substantiate the decisive role of redeposition for the emergence of well-ordered ion-beam eroded hexagonally arranged dot structures as, e.g., experimentally observed on various semiconductor targets.
Original languageEnglish
Article number17010
JournalEPL
Volume104
Issue number1
DOIs
Publication statusPublished - 1 Oct 2013
Externally publishedYes

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