Recombination and diffusion processes in an ICP investigated by the power interruption technique

J.M. Regt, de; J. Jonkers; J.J.A.M. Mullen, van der

doi:10.1109/PLASMA.1996.550685

Recombination and diffusion processes in an ICP investigated by the power interruption technique

J.M. Regt, de, J. Jonkers, J.J.A.M. Mullen, van der

Plasma & Materials Processing

Research output: Contribution to conference › Poster

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Abstract

Summary form only given. Inductively coupled plasmas (ICP) are widely used for spectrochemical analysis and might be efficient light sources of the future. Knowledge on the properties of these type of plasmas car improve their applicability. For this aim, fundamental research is carried out on the diffusion and recombination processes in an argon ICP by studying the electron density and temperature behavior during power interruption.

Original language	English
Pages	157-157
DOIs	https://doi.org/10.1109/PLASMA.1996.550685
Publication status	Published - 1996
Event	23rd IEEE International Conference on Plasma Science, ICOPS 1996 - Boston, United States Duration: 3 Jun 1996 → 5 Jun 1996 Conference number: 23

Conference

Conference	23rd IEEE International Conference on Plasma Science, ICOPS 1996
Abbreviated title	ICOPS 1996
Country/Territory	United States
City	Boston
Period	3/06/96 → 5/06/96

Bibliographical note

Poster presented at the 1996 IEEE international conference on plasma science, June 3-5, 1996, Boston, Massachusetts, USA

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10.1109/PLASMA.1996.550685

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@conference{090d7dbecafe4a07b11fe24ddf61f276,

title = "Recombination and diffusion processes in an ICP investigated by the power interruption technique",

abstract = "Summary form only given. Inductively coupled plasmas (ICP) are widely used for spectrochemical analysis and might be efficient light sources of the future. Knowledge on the properties of these type of plasmas car improve their applicability. For this aim, fundamental research is carried out on the diffusion and recombination processes in an argon ICP by studying the electron density and temperature behavior during power interruption.",

author = "\{Regt, de\}, J.M. and J. Jonkers and \{Mullen, van der\}, J.J.A.M.",

note = "Poster presented at the 1996 IEEE international conference on plasma science, June 3-5, 1996, Boston, Massachusetts, USA; 23rd IEEE International Conference on Plasma Science, ICOPS 1996, ICOPS 1996 ; Conference date: 03-06-1996 Through 05-06-1996",

year = "1996",

doi = "10.1109/PLASMA.1996.550685",

language = "English",

pages = "157--157",

}

TY - CONF

T1 - Recombination and diffusion processes in an ICP investigated by the power interruption technique

AU - Regt, de, J.M.

AU - Jonkers, J.

AU - Mullen, van der, J.J.A.M.

N1 - Conference code: 23

PY - 1996

Y1 - 1996

N2 - Summary form only given. Inductively coupled plasmas (ICP) are widely used for spectrochemical analysis and might be efficient light sources of the future. Knowledge on the properties of these type of plasmas car improve their applicability. For this aim, fundamental research is carried out on the diffusion and recombination processes in an argon ICP by studying the electron density and temperature behavior during power interruption.

AB - Summary form only given. Inductively coupled plasmas (ICP) are widely used for spectrochemical analysis and might be efficient light sources of the future. Knowledge on the properties of these type of plasmas car improve their applicability. For this aim, fundamental research is carried out on the diffusion and recombination processes in an argon ICP by studying the electron density and temperature behavior during power interruption.

U2 - 10.1109/PLASMA.1996.550685

DO - 10.1109/PLASMA.1996.550685

M3 - Poster

SP - 157

EP - 157

T2 - 23rd IEEE International Conference on Plasma Science, ICOPS 1996

Y2 - 3 June 1996 through 5 June 1996

ER -

Recombination and diffusion processes in an ICP investigated by the power interruption technique

Abstract

Conference

Bibliographical note

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