Recombination and diffusion in an inductively coupled argon plasma during power interruption

J.J.A.M. van der Mullen; J.M. Regt, de; J. Jonkers; F.P.J. de Groote

Recombination and diffusion in an inductively coupled argon plasma during power interruption

J.J.A.M. van der Mullen, J.M. Regt, de, J. Jonkers, F.P.J. de Groote

Plasma & Materials Processing

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

Original language	English
Title of host publication	Progress in Plasma Processing of Materials 1997 : Proceedings of the 4th International Thermal Plasma Processes Conference, Athens, July 15-18, 1996
Editors	P. Fauchais
Place of Publication	New York
Publisher	Begell House Inc.
Pages	165-173
Publication status	Published - 1997
Event	conference; Progress in Plasma Processing of Materials 1997 : the 4th International Thermal Plasma Processes Conference, Athens, July 15-18, 1996; 1996-07-15; 1996-07-18 - Duration: 15 Jul 1996 → 18 Jul 1996

Conference

Conference	conference; Progress in Plasma Processing of Materials 1997 : the 4th International Thermal Plasma Processes Conference, Athens, July 15-18, 1996; 1996-07-15; 1996-07-18
Period	15/07/96 → 18/07/96
Other	Progress in Plasma Processing of Materials 1997 : the 4th International Thermal Plasma Processes Conference, Athens, July 15-18, 1996

Cite this

van der Mullen, J. J. A. M., Regt, de, J. M., Jonkers, J., & de Groote, F. P. J. (1997). Recombination and diffusion in an inductively coupled argon plasma during power interruption. In P. Fauchais (Ed.), Progress in Plasma Processing of Materials 1997 : Proceedings of the 4th International Thermal Plasma Processes Conference, Athens, July 15-18, 1996 (pp. 165-173). Begell House Inc..

van der Mullen, J.J.A.M. ; Regt, de, J.M. ; Jonkers, J. et al. / Recombination and diffusion in an inductively coupled argon plasma during power interruption. Progress in Plasma Processing of Materials 1997 : Proceedings of the 4th International Thermal Plasma Processes Conference, Athens, July 15-18, 1996. editor / P. Fauchais. New York : Begell House Inc., 1997. pp. 165-173

@inproceedings{d125cdcc58494a5e96e211347bc3e17e,

title = "Recombination and diffusion in an inductively coupled argon plasma during power interruption",

author = "{van der Mullen}, J.J.A.M. and {Regt, de}, J.M. and J. Jonkers and {de Groote}, F.P.J.",

year = "1997",

language = "English",

pages = "165--173",

editor = "P. Fauchais",

booktitle = "Progress in Plasma Processing of Materials 1997 : Proceedings of the 4th International Thermal Plasma Processes Conference, Athens, July 15-18, 1996",

publisher = "Begell House Inc.",

address = "United States",

note = "conference; Progress in Plasma Processing of Materials 1997 : the 4th International Thermal Plasma Processes Conference, Athens, July 15-18, 1996; 1996-07-15; 1996-07-18 ; Conference date: 15-07-1996 Through 18-07-1996",

}

van der Mullen, JJAM, Regt, de, JM, Jonkers, J & de Groote, FPJ 1997, Recombination and diffusion in an inductively coupled argon plasma during power interruption. in P Fauchais (ed.), Progress in Plasma Processing of Materials 1997 : Proceedings of the 4th International Thermal Plasma Processes Conference, Athens, July 15-18, 1996. Begell House Inc., New York, pp. 165-173, conference; Progress in Plasma Processing of Materials 1997 : the 4th International Thermal Plasma Processes Conference, Athens, July 15-18, 1996; 1996-07-15; 1996-07-18, 15/07/96.

Recombination and diffusion in an inductively coupled argon plasma during power interruption. / van der Mullen, J.J.A.M.; Regt, de, J.M.; Jonkers, J. et al.
Progress in Plasma Processing of Materials 1997 : Proceedings of the 4th International Thermal Plasma Processes Conference, Athens, July 15-18, 1996. ed. / P. Fauchais. New York: Begell House Inc., 1997. p. 165-173.

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

TY - GEN

T1 - Recombination and diffusion in an inductively coupled argon plasma during power interruption

AU - van der Mullen, J.J.A.M.

AU - Regt, de, J.M.

AU - Jonkers, J.

AU - de Groote, F.P.J.

PY - 1997

Y1 - 1997

M3 - Conference contribution

SP - 165

EP - 173

BT - Progress in Plasma Processing of Materials 1997 : Proceedings of the 4th International Thermal Plasma Processes Conference, Athens, July 15-18, 1996

A2 - Fauchais, P.

PB - Begell House Inc.

CY - New York

T2 - conference; Progress in Plasma Processing of Materials 1997 : the 4th International Thermal Plasma Processes Conference, Athens, July 15-18, 1996; 1996-07-15; 1996-07-18

Y2 - 15 July 1996 through 18 July 1996

ER -

van der Mullen JJAM, Regt, de JM, Jonkers J, de Groote FPJ. Recombination and diffusion in an inductively coupled argon plasma during power interruption. In Fauchais P, editor, Progress in Plasma Processing of Materials 1997 : Proceedings of the 4th International Thermal Plasma Processes Conference, Athens, July 15-18, 1996. New York: Begell House Inc. 1997. p. 165-173