Realisation of submicron gate MESFETs using standard optical photolithography

A. Kalfane; F. Karouta; H.C. Heyker; J.J.M. Kwaspen; F.J.E. Lenting

Realisation of submicron gate MESFETs using standard optical photolithography

A. Kalfane
, F. Karouta
, H.C. Heyker
, J.J.M. Kwaspen
, F.J.E. Lenting

Photonic Integration

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

Original language	English
Title of host publication	1996 Conference on Optoelectronics and Microelectronics Materials and Devices, COMMAD '96, Australian National University
Pages	223-226
Publication status	Published - 1996
Event	1996 Conference on Optoelectronic and Microelectronic Materials and Devices (COMMAD 1996) - Australian National University, Canberra, Australia Duration: 9 Dec 1996 → 11 Dec 1996

Conference

Conference	1996 Conference on Optoelectronic and Microelectronic Materials and Devices (COMMAD 1996)
Abbreviated title	COMMAD 1996
Country/Territory	Australia
City	Canberra
Period	9/12/96 → 11/12/96

Cite this

@inproceedings{7fb49c730e174cbfa349ddd5ae8238b9,

title = "Realisation of submicron gate MESFETs using standard optical photolithography",

author = "A. Kalfane and F. Karouta and H.C. Heyker and J.J.M. Kwaspen and F.J.E. Lenting",

year = "1996",

language = "English",

pages = "223--226",

booktitle = "1996 Conference on Optoelectronics and Microelectronics Materials and Devices, COMMAD '96, Australian National University",

note = "1996 Conference on Optoelectronic and Microelectronic Materials and Devices (COMMAD 1996), COMMAD 1996 ; Conference date: 09-12-1996 Through 11-12-1996",

}

Kalfane, A, Karouta, F, Heyker, HC, Kwaspen, JJM & Lenting, FJE 1996, Realisation of submicron gate MESFETs using standard optical photolithography. in 1996 Conference on Optoelectronics and Microelectronics Materials and Devices, COMMAD '96, Australian National University. pp. 223-226, 1996 Conference on Optoelectronic and Microelectronic Materials and Devices (COMMAD 1996), Canberra, Australia, 9/12/96.

Realisation of submicron gate MESFETs using standard optical photolithography. / Kalfane, A.; Karouta, F.; Heyker, H.C. et al.
1996 Conference on Optoelectronics and Microelectronics Materials and Devices, COMMAD '96, Australian National University. 1996. p. 223-226.

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

TY - GEN

T1 - Realisation of submicron gate MESFETs using standard optical photolithography

AU - Kalfane, A.

AU - Karouta, F.

AU - Heyker, H.C.

AU - Kwaspen, J.J.M.

AU - Lenting, F.J.E.

PY - 1996

Y1 - 1996

M3 - Conference contribution

SP - 223

EP - 226

BT - 1996 Conference on Optoelectronics and Microelectronics Materials and Devices, COMMAD '96, Australian National University

T2 - 1996 Conference on Optoelectronic and Microelectronic Materials and Devices (COMMAD 1996)

Y2 - 9 December 1996 through 11 December 1996

ER -