Reactive phase formation in the diffusion zone between Si3N4 and Ni-Cr alloys

A. Kodentsov, J. Kivilahti, F.J.J. Loo, van

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

Abstract

The interaction between dense Si3N4 and Ni-Cr-alloys at 1398K was investigated. Reactive phase formation can be explained by assuming a N2-pressure at the interface. To understand the thermodn. and diffusion kinetics in this system direct nitriding of Ni,Cr(Si)-alloys from the N2-gas atm. was performed and a thermodn. description of the nitrogen behavior was attempted by using the Thermo-calc databank system. The \"up hill\" diffusion of nitrogen towards the front of nitride ppts. can be predicted. [on SciFinder (R)]
Original languageEnglish
Title of host publicationReactive phase formation at interfaces and diffusion processes : proceedings of the international meeting held in Aussois (France), May 21 - 28, 1993
EditorsY. Limoge, J.L. Bocquet
Place of PublicationAedermannsdorf
PublisherAedermannsdorf
Pages565-568
ISBN (Print)0-87849-680-7
DOIs
Publication statusPublished - 1994

Publication series

NameMaterials Science Forum
Volume155-156
ISSN (Print)0255-5476

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