Reaction and diffusion in multiphase systems : phenomenology and frames

F.J.J. Loo, van, B. Pieraggi

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

2 Citations (Scopus)

Abstract

The Kirkendall effect is well-known and documented for the diffusion in a single-phased substitutional solid soln. Also in multiphased systems, much exptl. evidences for the occurrence of the Kirkendall effect can also be found in the literature. However, the relevant observations are not always analyzed in terms of differing vacancy fluxes in the differing parts of such diffusion couple. The anal. recently proposed by the authors shows that the interface must be able both to create or annihilate the point defects involved in the diffusion process within the two adjoining phases. The implication of this model on the relative motion of the phase lattice with respect to the vol. center (Matano frame) and to the interface will be described and discussed. The specific case of the growth of an intermediate phase in binary systems is also considered. Some specific aspects for the case of ternary systems are discussed.
Original languageEnglish
Title of host publicationReactive phase formation at interfaces and diffusion processes : proceedings of the international meeting held in Aussois (France)
EditorsY. Limoge, J.L. Bocquet
Place of PublicationAedermannsdorf
PublisherTrans Tech Publications
Pages307-318
ISBN (Print)0-87849-680-7
DOIs
Publication statusPublished - 1994
Eventconference; International Meeting ; (Aussois) : 1993.05.21-28International Meeting ; (Aussois) : 1993.05.21-28; 1993-05-21; 1993-05-28 -
Duration: 21 May 199328 May 1993

Publication series

NameMaterials Science Forum
Volume155-156
ISSN (Print)0255-5476

Conference

Conferenceconference; International Meeting ; (Aussois) : 1993.05.21-28International Meeting ; (Aussois) : 1993.05.21-28; 1993-05-21; 1993-05-28
Period21/05/9328/05/93
OtherInternational Meeting ; (Aussois) : 1993.05.21-28International Meeting ; (Aussois) : 1993.05.21-28

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