Rapid thermal magnetic annealing: a novel technique in thin-film recording head production?

Fred Roozeboom; Jaap J M Ruigrok; Wilco Klaassens; Herbert Kegel; Manfred Falter; Heinrich Walk

Rapid thermal magnetic annealing: a novel technique in thin-film recording head production?

Fred Roozeboom, Jaap J M Ruigrok, Wilco Klaassens, Herbert Kegel, Manfred Falter, Heinrich Walk

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

Abstract

A new emerging application area for Rapid Thermal Annealing may be in the manufacturing of thin-film recording heads for high-density recording. To that end the authors co-designed a new commercial reactor with an external electromagnet to anneal thin soft-magnetic films deposited on ceramic wafers of up to 150 mm diameter. The electromagnet generates a field controllable up to 660 Oe (52.8 kA/m). It is completely homogeneous in direction across the entire wafer area. Wafers can be annealed either statically, or while rotating or in two subsequent heating steps with a 90° wafer rotation in between.

Original language	English
Title of host publication	1996 MRS Spring Symposium
Place of Publication	Warrendale
Publisher	Materials Research Society
Pages	203-210
Number of pages	8
Publication status	Published - 1 Dec 1996
Externally published	Yes
Event	1996 MRS Spring Meeting & Exhibit - San Francisco, United States Duration: 8 Apr 1996 → 12 Apr 1996 https://www.mrs.org/spring1996

Publication series

Name	Materials Research Society Symposium - Proceedings
Volume	429
ISSN (Print)	0272-9172

Conference

Conference	1996 MRS Spring Meeting & Exhibit
Country/Territory	United States
City	San Francisco
Period	8/04/96 → 12/04/96
Other	Symposium held at the 1996 MRS Spring Meeting
Internet address	https://www.mrs.org/spring1996

Cite this

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title = "Rapid thermal magnetic annealing: a novel technique in thin-film recording head production?",

abstract = "A new emerging application area for Rapid Thermal Annealing may be in the manufacturing of thin-film recording heads for high-density recording. To that end the authors co-designed a new commercial reactor with an external electromagnet to anneal thin soft-magnetic films deposited on ceramic wafers of up to 150 mm diameter. The electromagnet generates a field controllable up to 660 Oe (52.8 kA/m). It is completely homogeneous in direction across the entire wafer area. Wafers can be annealed either statically, or while rotating or in two subsequent heating steps with a 90° wafer rotation in between.",

author = "Fred Roozeboom and Ruigrok, {Jaap J M} and Wilco Klaassens and Herbert Kegel and Manfred Falter and Heinrich Walk",

year = "1996",

month = dec,

day = "1",

language = "English",

series = "Materials Research Society Symposium - Proceedings",

publisher = "Materials Research Society",

pages = "203--210",

booktitle = "1996 MRS Spring Symposium",

address = "United States",

note = "1996 MRS Spring Meeting & Exhibit ; Conference date: 08-04-1996 Through 12-04-1996",

url = "https://www.mrs.org/spring1996",

}

Roozeboom, F, Ruigrok, JJM, Klaassens, W, Kegel, H, Falter, M & Walk, H 1996, Rapid thermal magnetic annealing: a novel technique in thin-film recording head production? in 1996 MRS Spring Symposium. Materials Research Society Symposium - Proceedings, vol. 429, Materials Research Society, Warrendale, pp. 203-210, 1996 MRS Spring Meeting & Exhibit, San Francisco, California, United States, 8/04/96.

Rapid thermal magnetic annealing: a novel technique in thin-film recording head production? / Roozeboom, Fred; Ruigrok, Jaap J M; Klaassens, Wilco et al.
1996 MRS Spring Symposium. Warrendale: Materials Research Society, 1996. p. 203-210 (Materials Research Society Symposium - Proceedings; Vol. 429).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

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AU - Kegel, Herbert

AU - Falter, Manfred

AU - Walk, Heinrich

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AB - A new emerging application area for Rapid Thermal Annealing may be in the manufacturing of thin-film recording heads for high-density recording. To that end the authors co-designed a new commercial reactor with an external electromagnet to anneal thin soft-magnetic films deposited on ceramic wafers of up to 150 mm diameter. The electromagnet generates a field controllable up to 660 Oe (52.8 kA/m). It is completely homogeneous in direction across the entire wafer area. Wafers can be annealed either statically, or while rotating or in two subsequent heating steps with a 90° wafer rotation in between.

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ER -

Rapid thermal magnetic annealing: a novel technique in thin-film recording head production?

Abstract

Publication series

Conference

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