| Original language | English |
|---|---|
| Publication status | Published - 2005 |
| Event | conference; University Köln; 2005-01-20; 2005-01-20 - Duration: 20 Jan 2005 → 20 Jan 2005 |
Conference
| Conference | conference; University Köln; 2005-01-20; 2005-01-20 |
|---|---|
| Period | 20/01/05 → 20/01/05 |
| Other | University Köln |
Cite this
Sanden, van de, M. C. M. (2005). Radical and ion formation in an expanding thermal plasma used for thin film deposition. conference; University Köln; 2005-01-20; 2005-01-20, .
@conference{c118165cc3284069ae7863aef7937340,
title = "Radical and ion formation in an expanding thermal plasma used for thin film deposition",
author = "{Sanden, van de}, M.C.M.",
year = "2005",
language = "English",
note = "conference; University K{\"o}ln; 2005-01-20; 2005-01-20 ; Conference date: 20-01-2005 Through 20-01-2005",
}
Sanden, van de, MCM 2005, 'Radical and ion formation in an expanding thermal plasma used for thin film deposition', conference; University Köln; 2005-01-20; 2005-01-20, 20/01/05 - 20/01/05.
Radical and ion formation in an expanding thermal plasma used for thin film deposition. / Sanden, van de, M.C.M.
2005. conference; University Köln; 2005-01-20; 2005-01-20, .Research output: Contribution to conference › Other › Academic
TY - CONF
T1 - Radical and ion formation in an expanding thermal plasma used for thin film deposition
AU - Sanden, van de, M.C.M.
PY - 2005
Y1 - 2005
M3 - Other
ER -
Sanden, van de MCM. Radical and ion formation in an expanding thermal plasma used for thin film deposition. 2005. conference; University Köln; 2005-01-20; 2005-01-20, .