Radical and ion formation in an expanding thermal plasma used for thin film deposition

Research output: Contribution to conferenceOtherAcademic

Original languageEnglish
Publication statusPublished - 2005
Eventconference; University Köln; 2005-01-20; 2005-01-20 -
Duration: 20 Jan 200520 Jan 2005

Conference

Conferenceconference; University Köln; 2005-01-20; 2005-01-20
Period20/01/0520/01/05
OtherUniversity Köln

Cite this

@conference{c118165cc3284069ae7863aef7937340,
title = "Radical and ion formation in an expanding thermal plasma used for thin film deposition",
author = "{Sanden, van de}, M.C.M.",
year = "2005",
language = "English",
note = "conference; University K{\"o}ln; 2005-01-20; 2005-01-20 ; Conference date: 20-01-2005 Through 20-01-2005",

}

Sanden, van de, MCM 2005, 'Radical and ion formation in an expanding thermal plasma used for thin film deposition' conference; University Köln; 2005-01-20; 2005-01-20, 20/01/05 - 20/01/05, .

Radical and ion formation in an expanding thermal plasma used for thin film deposition. / Sanden, van de, M.C.M.

2005. conference; University Köln; 2005-01-20; 2005-01-20, .

Research output: Contribution to conferenceOtherAcademic

TY - CONF

T1 - Radical and ion formation in an expanding thermal plasma used for thin film deposition

AU - Sanden, van de, M.C.M.

PY - 2005

Y1 - 2005

M3 - Other

ER -