Radical and ion formation in an expanding thermal plasma used for thin film deposition

Research output: Contribution to conferenceOtherAcademic

Original languageEnglish
Publication statusPublished - 2005
Eventconference; Aston University; 2005-04-28; 2005-04-28 -
Duration: 28 Apr 200528 Apr 2005

Conference

Conferenceconference; Aston University; 2005-04-28; 2005-04-28
Period28/04/0528/04/05
OtherAston University

Cite this

@conference{90d35955e06d43a0a70c8a4d86899fc3,
title = "Radical and ion formation in an expanding thermal plasma used for thin film deposition",
author = "{Sanden, van de}, M.C.M.",
year = "2005",
language = "English",
note = "conference; Aston University; 2005-04-28; 2005-04-28 ; Conference date: 28-04-2005 Through 28-04-2005",

}

Sanden, van de, MCM 2005, 'Radical and ion formation in an expanding thermal plasma used for thin film deposition' conference; Aston University; 2005-04-28; 2005-04-28, 28/04/05 - 28/04/05, .

Radical and ion formation in an expanding thermal plasma used for thin film deposition. / Sanden, van de, M.C.M.

2005. conference; Aston University; 2005-04-28; 2005-04-28, .

Research output: Contribution to conferenceOtherAcademic

TY - CONF

T1 - Radical and ion formation in an expanding thermal plasma used for thin film deposition

AU - Sanden, van de, M.C.M.

PY - 2005

Y1 - 2005

M3 - Other

ER -