| Original language | English |
|---|---|
| Publication status | Published - 2005 |
| Event | conference; Aston University; 2005-04-28; 2005-04-28 - Duration: 28 Apr 2005 → 28 Apr 2005 |
Conference
| Conference | conference; Aston University; 2005-04-28; 2005-04-28 |
|---|---|
| Period | 28/04/05 → 28/04/05 |
| Other | Aston University |
Cite this
Sanden, van de, M. C. M. (2005). Radical and ion formation in an expanding thermal plasma used for thin film deposition. conference; Aston University; 2005-04-28; 2005-04-28, .
@conference{90d35955e06d43a0a70c8a4d86899fc3,
title = "Radical and ion formation in an expanding thermal plasma used for thin film deposition",
author = "{Sanden, van de}, M.C.M.",
year = "2005",
language = "English",
note = "conference; Aston University; 2005-04-28; 2005-04-28 ; Conference date: 28-04-2005 Through 28-04-2005",
}
Sanden, van de, MCM 2005, 'Radical and ion formation in an expanding thermal plasma used for thin film deposition', conference; Aston University; 2005-04-28; 2005-04-28, 28/04/05 - 28/04/05.
Radical and ion formation in an expanding thermal plasma used for thin film deposition. / Sanden, van de, M.C.M.
2005. conference; Aston University; 2005-04-28; 2005-04-28, .Research output: Contribution to conference › Other › Academic
TY - CONF
T1 - Radical and ion formation in an expanding thermal plasma used for thin film deposition
AU - Sanden, van de, M.C.M.
PY - 2005
Y1 - 2005
M3 - Other
ER -
Sanden, van de MCM. Radical and ion formation in an expanding thermal plasma used for thin film deposition. 2005. conference; Aston University; 2005-04-28; 2005-04-28, .