Quantum well intermixing in 980 nm laser structures using PECVD SiOxNy/SiOx layers

M. Buda, F. Karouta, G. Iordache, H.H. Tan, C. Jagadish, E. Smalbrugge, B.H. Roy, van, W.C. Vleuten, van der, A.Y. Silov

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

Original languageEnglish
Title of host publicationProc. 4th Annual Symposium of the IEEE/LEOS Benelux Chapter
Pages219-222
Publication statusPublished - 1999
Event4th Annual Symposium of the IEEE/LEOS Benelux Chapter, 1999 - Mons, Belgium
Duration: 15 Nov 199915 Nov 1999

Conference

Conference4th Annual Symposium of the IEEE/LEOS Benelux Chapter, 1999
CountryBelgium
CityMons
Period15/11/9915/11/99

Cite this

Buda, M., Karouta, F., Iordache, G., Tan, H. H., Jagadish, C., Smalbrugge, E., Roy, van, B. H., Vleuten, van der, W. C., & Silov, A. Y. (1999). Quantum well intermixing in 980 nm laser structures using PECVD SiOxNy/SiOx layers. In Proc. 4th Annual Symposium of the IEEE/LEOS Benelux Chapter (pp. 219-222)