Abstract
The electrophoretic deposition (EPD) technique is an attractive approach for development of graphene and graphene oxide (GO) films for a variety of applications. However, in order to establish the influence of the EPD parameters on the properties of the deposited films, a deeper investigation of the fundamental GO-EPD kinetics is required. Previous studies have reported a simultaneous anodic reduction of GO flakes during EPD, complicating the kinetics and process control. Therefore, in this study, low voltages were used to prevent significant GO reduction during EPD, as confirmed by XPS and FTIR. Accordingly, the GO-EPD kinetics was established as a function of deposition time and voltage, accompanied by microscopic characterization of the deposited films. The experimental results show that the deposition follows a linear growth law, in good agreement with the predictions of Hamaker's law. Comparisons of optical absorbance and profilometry provide estimates of (reduced) GO deposition rate, extinction coefficient, and density.
| Original language | English |
|---|---|
| Pages (from-to) | 656-661 |
| Number of pages | 6 |
| Journal | Carbon |
| Volume | 67 |
| DOIs | |
| Publication status | Published - 1 Jan 2014 |
| Externally published | Yes |
Funding
We would like to thank Prof. Jürgen Ristein and Ms. Parisa Khoram (Institute of Technical Physics, University of Erlangen-Nuremberg) for the XPS studies. M.D. would like to acknowledge the Erasmus exchange program of the European Commission , the Elite graduate program “Advanced Materials and Processes (MAP)” and the Elite Network of Bavaria (ENB) for financial support during the Erasmus exchange period. Appendix A