| Original language | English |
|---|---|
| Publisher | Technische Universiteit Eindhoven |
| Publication status | Published - 1998 |
Progress in reactive ion etching of epitaxial GaN
F. Karouta, P. Vreugdewater, B. Jacobs, B.H. Roy, van, O. Schön, H. Protzmann, M. Heuken
Research output: Non-textual form › Software › Professional