Progress in reactive ion etching of epitaxial GaN

F. Karouta, P. Vreugdewater, B. Jacobs, B.H. Roy, van, O. Schön, H. Protzmann, M. Heuken

Research output: Non-textual formSoftwareProfessional

Original languageEnglish
PublisherTechnische Universiteit Eindhoven
Publication statusPublished - 1998

Cite this

Karouta, F. (Author), Vreugdewater, P. (Author), Jacobs, B. (Author), Roy, van, B. H. (Author), Schön, O. (Author), Protzmann, H. (Author), & Heuken, M. (Author). (1998). Progress in reactive ion etching of epitaxial GaN. Software, Technische Universiteit Eindhoven.