Process for producing thin films and devices

R.E.I. Schropp (Inventor), C.H.M. van der Werf (Inventor), B. Stannowski (Inventor)

Research output: PatentPatent publication

Abstract

The present invention provides a silicon nitride thin film formation apparatus for stationary and moving substrates and a process for forming such films. The process provides high uniformity of film thickness and film properties as well as a high deposition rate. The film properties are adequate for application as a antireflection layer or passivation layer in solar cell devices or as dielectric layer in thin film transistors. The apparatus comprises a number of metal filaments. In the space within the formation apparatus opposite to the substrate with respect to the filaments, a gas dosage system is arranged at a predetermined distance of the filaments. The film formation apparatus for stationary substrates also contains a shutter to control the starting and ending conditions for film formation and to control the film thickness.

Original languageEnglish
Patent numberEP1574597
IPCH01L 21/ 318 A I
Priority date30/06/04
Publication statusPublished - 14 Sep 2005
Externally publishedYes

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  • Cite this

    Schropp, R. E. I., van der Werf, C. H. M., & Stannowski, B. (2005). IPC No. H01L 21/ 318 A I. Process for producing thin films and devices. (Patent No. EP1574597).