Preface: Atomic Layer Deposition Applications 8

Jeffrey W. Elam; Stefan De Gendt; Ana Londergan; Stacey F. Bent; O. van der Straten; Annelies Delabie; F. Roozeboom

Preface: Atomic Layer Deposition Applications 8

Jeffrey W. Elam, Stefan De Gendt, Ana Londergan, Stacey F. Bent, O. van der Straten, Annelies Delabie, F. Roozeboom

Plasma & Materials Processing

Research output: Contribution to journal › Editorial › Academic › peer-review

Original language	English
Pages (from-to)	III-IV
Journal	ECS Transactions
Volume	50
Issue number	13
Publication status	Published - 1 Jan 2012
Event	PRiME 2012 - Honolulu, HI, United States Duration: 7 Oct 2012 → 12 Oct 2017

Cite this

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title = "Preface: Atomic Layer Deposition Applications 8",

author = "Elam, {Jeffrey W.} and {De Gendt}, Stefan and Ana Londergan and Bent, {Stacey F.} and {van der Straten}, O. and Annelies Delabie and F. Roozeboom",

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AU - Elam, Jeffrey W.

AU - De Gendt, Stefan

AU - Londergan, Ana

AU - Bent, Stacey F.

AU - van der Straten, O.

AU - Delabie, Annelies

AU - Roozeboom, F.

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JO - ECS Transactions

JF - ECS Transactions

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Preface: Atomic Layer Deposition Applications 8

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