Preface: Atomic Layer Deposition Applications 14

Fred Roozeboom; Stefan De Gendt; Jeffrey W. Elam; Jolien Dendooven; Oscar van der Straten; Chanyuan Liu; A. Illiberi

Preface: Atomic Layer Deposition Applications 14

Fred Roozeboom, Stefan De Gendt, Jeffrey W. Elam, Jolien Dendooven, Oscar van der Straten, Chanyuan Liu, A. Illiberi

Plasma & Materials Processing

Research output: Contribution to journal › Editorial › Academic › peer-review

Original language	English
Pages (from-to)	III-IV
Number of pages	2
Journal	ECS Transactions
Volume	86
Issue number	6
Publication status	Published - 1 Oct 2018
Event	234th ECS Meeting / AiMES - Cancun, Cancun, Mexico Duration: 30 Sept 2018 → 4 Oct 2018 https://www.electrochem.org/aimes2018

Access to Document

http://ecst.ecsdl.org/content/86/6/local/front-matter.pdf

Cite this

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title = "Preface: Atomic Layer Deposition Applications 14",

author = "Fred Roozeboom and {De Gendt}, Stefan and Elam, {Jeffrey W.} and Jolien Dendooven and {van der Straten}, Oscar and Chanyuan Liu and A. Illiberi",

year = "2018",

month = oct,

day = "1",

language = "English",

volume = "86",

pages = "III--IV",

journal = "ECS Transactions",

issn = "1938-5862",

publisher = "Electrochemical Society, Inc.",

number = "6",

note = "234th ECS Meeting / AiMES ; Conference date: 30-09-2018 Through 04-10-2018",

url = "https://www.electrochem.org/aimes2018",

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T1 - Preface

T2 - 234th ECS Meeting / AiMES

AU - Roozeboom, Fred

AU - De Gendt, Stefan

AU - Elam, Jeffrey W.

AU - Dendooven, Jolien

AU - van der Straten, Oscar

AU - Liu, Chanyuan

AU - Illiberi, A.

PY - 2018/10/1

Y1 - 2018/10/1

M3 - Editorial

SN - 1938-5862

VL - 86

SP - III-IV

JO - ECS Transactions

JF - ECS Transactions

IS - 6

Y2 - 30 September 2018 through 4 October 2018

ER -