Preface: atomic layer deposition applications 12

F. Roozeboom, Stefan de Gendt, Jeffrey W. Elam, O. van der Straten, J. Dendooven, C. Liu, C. Huffmann

Research output: Contribution to journal › Editorial › Academic › peer-review

Original language	English
Pages (from-to)	III-IV
Journal	ECS Transactions
Volume	75
Issue number	6
Publication status	Published - 2 Oct 2016
Event	Symposium on Atomic Layer Deposition Applications 12 - PRiME 2016/230th ECS Meeting - Honolulu, United States Duration: 2 Oct 2016 → 7 Oct 2016 https://ecs.confex.com/ecs/230/cfp.cgi

Cite this

@article{00a43537478d4b0ca42d90dcc38a41f1,

title = "Preface: atomic layer deposition applications 12 ",

author = "F. Roozeboom and {de Gendt}, Stefan and Elam, {Jeffrey W.} and {van der Straten}, O. and J. Dendooven and C. Liu and C. Huffmann",

year = "2016",

month = oct,

day = "2",

language = "English",

volume = "75",

pages = "III--IV",

journal = "ECS Transactions",

issn = "1938-5862",

publisher = "Electrochemical Society, Inc.",

number = "6",

note = "Symposium on Atomic Layer Deposition Applications 12 - PRiME 2016/230th ECS Meeting ; Conference date: 02-10-2016 Through 07-10-2016",

url = "https://ecs.confex.com/ecs/230/cfp.cgi",

}

TY - JOUR

T1 - Preface

T2 - Symposium on Atomic Layer Deposition Applications 12 - PRiME 2016/230th ECS Meeting

AU - Roozeboom, F.

AU - de Gendt, Stefan

AU - Elam, Jeffrey W.

AU - van der Straten, O.

AU - Dendooven, J.

AU - Liu, C.

AU - Huffmann, C.

PY - 2016/10/2

Y1 - 2016/10/2

UR - http://ecst.ecsdl.org/content/75/6

M3 - Editorial

SN - 1938-5862

VL - 75

SP - III-IV

JO - ECS Transactions

JF - ECS Transactions

IS - 6

Y2 - 2 October 2016 through 7 October 2016

ER -