| Original language | English |
|---|---|
| Pages (from-to) | III-IV |
| Number of pages | 2 |
| Journal | ECS Transactions |
| Volume | 80 |
| Issue number | 3 |
| Publication status | Published - 1 Oct 2017 |
Preface: atomic layer deposition application 13
F. Roozeboom, Stefan de Gendt, Jeffrey W. Elam, O. van der Straten, J. Dendooven, C. Liu
Research output: Contribution to journal › Editorial › Academic › peer-review