Original language | English |
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Pages (from-to) | III-IV |
Number of pages | 2 |
Journal | ECS Transactions |
Volume | 80 |
Issue number | 3 |
Publication status | Published - 1 Oct 2017 |
Preface: atomic layer deposition application 13
F. Roozeboom, Stefan de Gendt, Jeffrey W. Elam, O. van der Straten, J. Dendooven, C. Liu
Research output: Contribution to journal › Editorial › Academic › peer-review