Preface: atomic layer deposition application 13

F. Roozeboom, Stefan de Gendt, Jeffrey W. Elam, O. van der Straten, J. Dendooven, C. Liu

Research output: Contribution to journalEditorialAcademicpeer-review

Original languageEnglish
Pages (from-to)III-IV
Number of pages2
JournalECS Transactions
Volume80
Issue number3
Publication statusPublished - 1 Oct 2017

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