Original language | English |
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Pages (from-to) | iii |
Number of pages | 1 |
Journal | ECS Transactions |
Volume | 13 |
Issue number | 1 |
Publication status | Published - 13 Nov 2008 |
Event | Advanced Gate Stack, Source/Drain, and Channel Engineering for Si-Based CMOS: New Materials, Processes, and Equipment, 4 - Phoenix, AZ, United States Duration: 18 May 2008 → 22 May 2008 |
Preface: Advanced Gate Stack, Source/Drain, and Channel Engineering for Si-Based CMOS 4: New Materials, Processes, and Equipment
P.J. Timans, D.L. Kwong, H. Iwai, E.P. Gusev, F. Roozeboom, M. Öztürk
Research output: Contribution to journal › Editorial › Academic › peer-review
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