Preface: Advanced Gate Stack, Source/Drain, and Channel Engineering for Si-Based CMOS 4: New Materials, Processes, and Equipment

P.J. Timans, D.L. Kwong, H. Iwai, E.P. Gusev, F. Roozeboom, M. Öztürk

Research output: Contribution to journalEditorialAcademicpeer-review

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Original languageEnglish
Pages (from-to)iii
Number of pages1
JournalECS Transactions
Volume13
Issue number1
Publication statusPublished - 13 Nov 2008
EventAdvanced Gate Stack, Source/Drain, and Channel Engineering for Si-Based CMOS: New Materials, Processes, and Equipment, 4 - Phoenix, AZ, United States
Duration: 18 May 200822 May 2008

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