Preface : Advanced gate stack, source/drain and channel engineering for Si-based CMOS 4 : new materials, processes and equipment

P.J. Timans, D.-L. Kwong, H. Iwai, E.P. Gusev, F. Roozeboom, M. Öztürk

Research output: Contribution to journalEditorialAcademic

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Original languageEnglish
Pages (from-to)III-
Number of pages1
JournalECS Transactions
Volume13
Issue number1
Publication statusPublished - 2008

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