Preface

F. Roozeboom; V. Narayanan; K. Kakushima; D. L. Kwong; H. Iwai; E. P. Gusev; P. J. Timans

Preface

F. Roozeboom, V. Narayanan, K. Kakushima, D. L. Kwong, H. Iwai, E. P. Gusev, P. J. Timans

Plasma & Materials Processing

Research output: Contribution to journal › Editorial › Academic › peer-review

Original language	English
Pages (from-to)	iii-iv
Number of pages	2
Journal	ECS Transactions
Volume	45
Issue number	6
Publication status	Published - 19 Nov 2012
Event	International Symposium on Silicon Compatible Materials, Processes, and Technologies for Advanced Integrated Circuits and Emerging Applications 2 - 221st ECS Meeting - Seattle, United States Duration: 6 May 2012 → 10 May 2012

Cite this

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title = "Preface",

author = "F. Roozeboom and V. Narayanan and K. Kakushima and Kwong, {D. L.} and H. Iwai and Gusev, {E. P.} and Timans, {P. J.}",

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TY - JOUR

T1 - Preface

AU - Roozeboom, F.

AU - Narayanan, V.

AU - Kakushima, K.

AU - Kwong, D. L.

AU - Iwai, H.

AU - Gusev, E. P.

AU - Timans, P. J.

PY - 2012/11/19

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M3 - Editorial

AN - SCOPUS:84869045989

VL - 45

SP - iii-iv

JO - ECS Transactions

JF - ECS Transactions

SN - 1938-5862

IS - 6

T2 - International Symposium on Silicon Compatible Materials, Processes, and Technologies for Advanced Integrated Circuits and Emerging Applications 2 - 221st ECS Meeting

Y2 - 6 May 2012 through 10 May 2012

ER -

Preface

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