Original language | English |
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Pages (from-to) | iii-iv |
Journal | ECS Transactions |
Volume | 53 |
Issue number | 3 |
Publication status | Published - 21 Oct 2013 |
Event | International Symposium on Silicon Compatible Materials, Processes, and Technologies for Advanced Integrated Circuits and Emerging Applications 3 - 223rd ECS Meeting - Toronto, ON, Canada Duration: 12 May 2013 → 17 May 2013 |
Preface
F. Roozeboom, V. Narayanan, K. Kakushima, H. Iwai, D. L. Kwong, P. J. Timans, E. P. Gusev
Research output: Contribution to journal › Editorial › Academic › peer-review