Preface

Fred Roozeboom; Stefan De Gendt; Jolien Dendooven; Jeffrey W. Elam; Oscar Van Der Straten; Chanyuan Liu; Ganesh Sundaram; Andrea Illiberi

Preface

Fred Roozeboom, Stefan De Gendt, Jolien Dendooven, Jeffrey W. Elam, Oscar Van Der Straten, Chanyuan Liu, Ganesh Sundaram, Andrea Illiberi

Plasma & Materials Processing

Research output: Contribution to journal › Editorial › Academic › peer-review

Original language	English
Pages (from-to)	iii-iv
Journal	ECS Transactions
Volume	92
Issue number	3
Publication status	Published - 1 Jan 2019
Event	International Symposium on Atomic Layer Deposition Applications 15 - 236th ECS Meeting - Atlanta, United States Duration: 13 Oct 2019 → 17 Oct 2019

Cite this

@article{e98ad06b4c0d439bac5d248a79b8a84d,

title = "Preface",

author = "Fred Roozeboom and {De Gendt}, Stefan and Jolien Dendooven and Elam, {Jeffrey W.} and {Van Der Straten}, Oscar and Chanyuan Liu and Ganesh Sundaram and Andrea Illiberi",

year = "2019",

month = jan,

day = "1",

language = "English",

volume = "92",

pages = "iii--iv",

journal = "ECS Transactions",

issn = "1938-5862",

publisher = "Electrochemical Society, Inc.",

number = "3",

note = "International Symposium on Atomic Layer Deposition Applications 15 - 236th ECS Meeting ; Conference date: 13-10-2019 Through 17-10-2019",

}

TY - JOUR

T1 - Preface

AU - Roozeboom, Fred

AU - De Gendt, Stefan

AU - Dendooven, Jolien

AU - Elam, Jeffrey W.

AU - Van Der Straten, Oscar

AU - Liu, Chanyuan

AU - Sundaram, Ganesh

AU - Illiberi, Andrea

PY - 2019/1/1

Y1 - 2019/1/1

UR - http://www.scopus.com/inward/record.url?scp=85077213144&partnerID=8YFLogxK

M3 - Editorial

AN - SCOPUS:85077213144

SN - 1938-5862

VL - 92

SP - iii-iv

JO - ECS Transactions

JF - ECS Transactions

IS - 3

T2 - International Symposium on Atomic Layer Deposition Applications 15 - 236th ECS Meeting

Y2 - 13 October 2019 through 17 October 2019

ER -

Preface

Other files and links

Cite this