POx/Al2O3 Stacks for c-Si Surface Passivation: Material and Interface Properties

R.J. Theeuwes (Corresponding author), Jimmy Melskens, Lachlan E. Black, Wolfhard Beyer, Dibyashree Koushik, Willem-Jan H. Berghuis, Bart Macco, W.M.M. Kessels (Corresponding author)

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