Post-processing of a polarization converter for integrated polarization independent SOA

M. Felicetti; J.J.G.M. Tol, van der; E.J. Geluk; P.J. Williams; M.K. Smit

Post-processing of a polarization converter for integrated polarization independent SOA

M. Felicetti, J.J.G.M. Tol, van der, E.J. Geluk, P.J. Williams, M.K. Smit

Photonic Integration

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

Abstract

We report the post-processing of a passive polarisation converter (PC) in a photonic integrated circuit that is realized in a Multi_Project Wafer run at Oclaro. The chip contains structures for testing the PC in a polarization independent SOA configuration. Photo-resist is used to protect the existing devices, and a photo-lithography step defines the PC processing area. The device is made using wet etching to define the PC sloped sidewall, and EBL to define the PC waveguide. The measurement results show that the polarization dependence of the SOA reduced from 14 dB to 3 dB with the PC insertion.

Original language	English
Title of host publication	Proceedings of the 16th Annual symposium of the IEEE Photonics Benelux Chapter, 01-02 December 2011, Ghent, Belgium
Editors	P. Bienstman, G. Morthier, G. Roelkens, xx et al.
Place of Publication	Ghent, Belgium
Publisher	Universiteit Gent
Pages	177-180
ISBN (Print)	978-90-85784-67-8
Publication status	Published - 2011
Event	16th Annual Symposium of the IEEE Photonics Benelux Chapter - Ghent, Belgium Duration: 1 Dec 2011 → 2 Dec 2011 Conference number: 16 http://www.photonics-benelux.org/symp11/

Conference

Conference	16th Annual Symposium of the IEEE Photonics Benelux Chapter
Country/Territory	Belgium
City	Ghent
Period	1/12/11 → 2/12/11
Internet address	http://www.photonics-benelux.org/symp11/

Cite this

Felicetti, M., Tol, van der, J. J. G. M., Geluk, E. J., Williams, P. J., & Smit, M. K. (2011). Post-processing of a polarization converter for integrated polarization independent SOA. In P. Bienstman, G. Morthier, G. Roelkens, & X. et al. (Eds.), Proceedings of the 16th Annual symposium of the IEEE Photonics Benelux Chapter, 01-02 December 2011, Ghent, Belgium (pp. 177-180). Universiteit Gent.

Felicetti, M. ; Tol, van der, J.J.G.M. ; Geluk, E.J. et al. / Post-processing of a polarization converter for integrated polarization independent SOA. Proceedings of the 16th Annual symposium of the IEEE Photonics Benelux Chapter, 01-02 December 2011, Ghent, Belgium. editor / P. Bienstman ; G. Morthier ; G. Roelkens ; xx et al. Ghent, Belgium : Universiteit Gent, 2011. pp. 177-180

@inproceedings{9d5cad9f1d9c4bf18d0e4f91a986be6c,

title = "Post-processing of a polarization converter for integrated polarization independent SOA",

abstract = "We report the post-processing of a passive polarisation converter (PC) in a photonic integrated circuit that is realized in a Multi_Project Wafer run at Oclaro. The chip contains structures for testing the PC in a polarization independent SOA configuration. Photo-resist is used to protect the existing devices, and a photo-lithography step defines the PC processing area. The device is made using wet etching to define the PC sloped sidewall, and EBL to define the PC waveguide. The measurement results show that the polarization dependence of the SOA reduced from 14 dB to 3 dB with the PC insertion.",

author = "M. Felicetti and {Tol, van der}, J.J.G.M. and E.J. Geluk and P.J. Williams and M.K. Smit",

year = "2011",

language = "English",

isbn = "978-90-85784-67-8",

publisher = "Universiteit Gent",

pages = "177--180",

editor = "P. Bienstman and G. Morthier and G. Roelkens and {et al.}, xx",

booktitle = "Proceedings of the 16th Annual symposium of the IEEE Photonics Benelux Chapter, 01-02 December 2011, Ghent, Belgium",

note = "16th Annual Symposium of the IEEE Photonics Benelux Chapter ; Conference date: 01-12-2011 Through 02-12-2011",

url = "http://www.photonics-benelux.org/symp11/",

}

Felicetti, M, Tol, van der, JJGM, Geluk, EJ, Williams, PJ & Smit, MK 2011, Post-processing of a polarization converter for integrated polarization independent SOA. in P Bienstman, G Morthier, G Roelkens & X et al. (eds), Proceedings of the 16th Annual symposium of the IEEE Photonics Benelux Chapter, 01-02 December 2011, Ghent, Belgium. Universiteit Gent, Ghent, Belgium, pp. 177-180, 16th Annual Symposium of the IEEE Photonics Benelux Chapter, Ghent, Belgium, 1/12/11.

Post-processing of a polarization converter for integrated polarization independent SOA. / Felicetti, M.; Tol, van der, J.J.G.M.; Geluk, E.J. et al.
Proceedings of the 16th Annual symposium of the IEEE Photonics Benelux Chapter, 01-02 December 2011, Ghent, Belgium. ed. / P. Bienstman; G. Morthier; G. Roelkens; xx et al. Ghent, Belgium: Universiteit Gent, 2011. p. 177-180.

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

TY - GEN

T1 - Post-processing of a polarization converter for integrated polarization independent SOA

AU - Felicetti, M.

AU - Tol, van der, J.J.G.M.

AU - Geluk, E.J.

AU - Williams, P.J.

AU - Smit, M.K.

N1 - Conference code: 16

PY - 2011

Y1 - 2011

N2 - We report the post-processing of a passive polarisation converter (PC) in a photonic integrated circuit that is realized in a Multi_Project Wafer run at Oclaro. The chip contains structures for testing the PC in a polarization independent SOA configuration. Photo-resist is used to protect the existing devices, and a photo-lithography step defines the PC processing area. The device is made using wet etching to define the PC sloped sidewall, and EBL to define the PC waveguide. The measurement results show that the polarization dependence of the SOA reduced from 14 dB to 3 dB with the PC insertion.

AB - We report the post-processing of a passive polarisation converter (PC) in a photonic integrated circuit that is realized in a Multi_Project Wafer run at Oclaro. The chip contains structures for testing the PC in a polarization independent SOA configuration. Photo-resist is used to protect the existing devices, and a photo-lithography step defines the PC processing area. The device is made using wet etching to define the PC sloped sidewall, and EBL to define the PC waveguide. The measurement results show that the polarization dependence of the SOA reduced from 14 dB to 3 dB with the PC insertion.

M3 - Conference contribution

SN - 978-90-85784-67-8

SP - 177

EP - 180

BT - Proceedings of the 16th Annual symposium of the IEEE Photonics Benelux Chapter, 01-02 December 2011, Ghent, Belgium

A2 - Bienstman, P.

A2 - Morthier, G.

A2 - Roelkens, G.

A2 - et al., xx

PB - Universiteit Gent

CY - Ghent, Belgium

T2 - 16th Annual Symposium of the IEEE Photonics Benelux Chapter

Y2 - 1 December 2011 through 2 December 2011

ER -

Felicetti M, Tol, van der JJGM, Geluk EJ, Williams PJ, Smit MK. Post-processing of a polarization converter for integrated polarization independent SOA. In Bienstman P, Morthier G, Roelkens G, et al. X, editors, Proceedings of the 16th Annual symposium of the IEEE Photonics Benelux Chapter, 01-02 December 2011, Ghent, Belgium. Ghent, Belgium: Universiteit Gent. 2011. p. 177-180

Post-processing of a polarization converter for integrated polarization independent SOA

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