Position control in lithographic equipment : an enabler for current-day chip manufacturing

H. Butler

doi:10.1109/MCS.2011.941882

Position control in lithographic equipment : an enabler for current-day chip manufacturing

H. Butler

Control Systems

Research output: Contribution to journal › Article › Academic › peer-review

450 Citations (Scopus)

37 Downloads (Pure)

Abstract

This article describes the basic optical principles in the lithographic tool, with the resulting positioning accuracy requirements. For three generations of lithographic tools, the mechatronic architecture and control implications are discussed. Then, six degrees of freedom (DOF) stage control is described with the main focus on actuator force decoupling, allowing the use of classical single-input, single-output (SISO) controllers.

Original language	English
Pages (from-to)	28-47
Number of pages	20
Journal	IEEE Control Systems
Volume	31
Issue number	5
DOIs	https://doi.org/10.1109/MCS.2011.941882
Publication status	Published - 2011

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10.1109/MCS.2011.941882

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abstract = "This article describes the basic optical principles in the lithographic tool, with the resulting positioning accuracy requirements. For three generations of lithographic tools, the mechatronic architecture and control implications are discussed. Then, six degrees of freedom (DOF) stage control is described with the main focus on actuator force decoupling, allowing the use of classical single-input, single-output (SISO) controllers.",

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AB - This article describes the basic optical principles in the lithographic tool, with the resulting positioning accuracy requirements. For three generations of lithographic tools, the mechatronic architecture and control implications are discussed. Then, six degrees of freedom (DOF) stage control is described with the main focus on actuator force decoupling, allowing the use of classical single-input, single-output (SISO) controllers.

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Position control in lithographic equipment : an enabler for current-day chip manufacturing

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