| Original language | English |
|---|---|
| Place of Publication | Eindhoven |
| Publisher | Chemische Reactor Technologie |
| Number of pages | 56 |
| Publication status | Published - 1995 |
Polysilicon deposition, LPCVD reactor modelling and design : Final report of the Interreg-IDIS programme
W.L.M. Weerts, N.M.A. de Wild, M.H.J.M. Croon, de
Research output: Book/Report › Report › Academic