Polymer layers by Initiated CVD for thin film gas barrier encapsulation

D.A. Spee; J.K. Rath; R.E.I. Schropp

doi:10.1002/9781118729175.ch9

Polymer layers by Initiated CVD for thin film gas barrier encapsulation

D.A. Spee
, J.K. Rath
, R.E.I. Schropp

Research output: Chapter in Book/Report/Conference proceeding › Chapter › Academic › peer-review

3 Citations (Scopus)

Abstract

In this chapter a thorough description of the initiated chemical vapor deposition (iCVD) process will be given, concentrating on molecular weight and deposition rate of the deposited polymer, which are essential for largescale application in hybrid gas barriers. Practical applications of coatings by iCVD are addressed, and it will be shown that iCVD single layers can be used individually as gas barriers. However, so far the intrinsic moisture barrier function of polymers is too low to meet the strict requirements that are needed for organic light emitting diodes (OLEDs) and organic solar cells. Ultra-high gas barriers, with a WVTR

Original language	English
Title of host publication	Encapsulation nanotechnologies
Editors	V. Mittal
Place of Publication	Beverly
Publisher	Scrivener Publishing
Chapter	9
Pages	291-345
ISBN (Print)	978-1-118-34455-2
DOIs	https://doi.org/10.1002/9781118729175.ch9
Publication status	Published - 13 May 2013
Externally published	Yes

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10.1002/9781118729175.ch9

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abstract = "In this chapter a thorough description of the initiated chemical vapor deposition (iCVD) process will be given, concentrating on molecular weight and deposition rate of the deposited polymer, which are essential for largescale application in hybrid gas barriers. Practical applications of coatings by iCVD are addressed, and it will be shown that iCVD single layers can be used individually as gas barriers. However, so far the intrinsic moisture barrier function of polymers is too low to meet the strict requirements that are needed for organic light emitting diodes (OLEDs) and organic solar cells. Ultra-high gas barriers, with a WVTR",

author = "D.A. Spee and J.K. Rath and R.E.I. Schropp",

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AU - Rath, J.K.

AU - Schropp, R.E.I.

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Y1 - 2013/5/13

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AB - In this chapter a thorough description of the initiated chemical vapor deposition (iCVD) process will be given, concentrating on molecular weight and deposition rate of the deposited polymer, which are essential for largescale application in hybrid gas barriers. Practical applications of coatings by iCVD are addressed, and it will be shown that iCVD single layers can be used individually as gas barriers. However, so far the intrinsic moisture barrier function of polymers is too low to meet the strict requirements that are needed for organic light emitting diodes (OLEDs) and organic solar cells. Ultra-high gas barriers, with a WVTR

U2 - 10.1002/9781118729175.ch9

DO - 10.1002/9781118729175.ch9

M3 - Chapter

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BT - Encapsulation nanotechnologies

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PB - Scrivener Publishing

CY - Beverly

ER -

Polymer layers by Initiated CVD for thin film gas barrier encapsulation

Abstract

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