Polarization-selective patterning in an anisotropic smectic B film

M.P. Van; C.W.M. Bastiaansen; D.J. Broer

doi:10.1002/adom.201500704

Polarization-selective patterning in an anisotropic smectic B film

M.P. Van
, C.W.M. Bastiaansen
, D.J. Broer

Research output: Contribution to journal › Article › Academic › peer-review

4 Citations (Scopus)

349 Downloads (Pure)

Abstract

The versatility of optical lithography can be expanded by using the polarization state of light as an additional parameter next to the intensity of light. This result is confirmed by exposing a highly polarization-selective photoreactive material with polarization holography which results in the formation of defined grating structures.

Original language	English
Pages (from-to)	677-681
Number of pages	5
Journal	Advanced Optical Materials
Volume	4
Issue number	5
DOIs	https://doi.org/10.1002/adom.201500704
Publication status	Published - 1 May 2016

Keywords

Dichroic photoinitiators
Liquid crystals
Lithography
Patterning
Polarization-selectivity

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10.1002/adom.201500704

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Cite this

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title = "Polarization-selective patterning in an anisotropic smectic B film",

abstract = "The versatility of optical lithography can be expanded by using the polarization state of light as an additional parameter next to the intensity of light. This result is confirmed by exposing a highly polarization-selective photoreactive material with polarization holography which results in the formation of defined grating structures.",

keywords = "Dichroic photoinitiators, Liquid crystals, Lithography, Patterning, Polarization-selectivity",

author = "M.P. Van and C.W.M. Bastiaansen and D.J. Broer",

year = "2016",

month = may,

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doi = "10.1002/adom.201500704",

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AU - Van, M.P.

AU - Bastiaansen, C.W.M.

AU - Broer, D.J.

PY - 2016/5/1

Y1 - 2016/5/1

N2 - The versatility of optical lithography can be expanded by using the polarization state of light as an additional parameter next to the intensity of light. This result is confirmed by exposing a highly polarization-selective photoreactive material with polarization holography which results in the formation of defined grating structures.

AB - The versatility of optical lithography can be expanded by using the polarization state of light as an additional parameter next to the intensity of light. This result is confirmed by exposing a highly polarization-selective photoreactive material with polarization holography which results in the formation of defined grating structures.

KW - Dichroic photoinitiators

KW - Liquid crystals

KW - Lithography

KW - Patterning

KW - Polarization-selectivity

UR - https://www.scopus.com/pages/publications/84958212945

U2 - 10.1002/adom.201500704

DO - 10.1002/adom.201500704

M3 - Article

AN - SCOPUS:84958212945

SN - 2195-1071

VL - 4

SP - 677

EP - 681

JO - Advanced Optical Materials

JF - Advanced Optical Materials

IS - 5

ER -

Polarization-selective patterning in an anisotropic smectic B film

Abstract

Keywords

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