Polarization-selective patterning in an anisotropic smectic B film

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Abstract

The versatility of optical lithography can be expanded by using the polarization state of light as an additional parameter next to the intensity of light. This result is confirmed by exposing a highly polarization-selective photoreactive material with polarization holography which results in the formation of defined grating structures.
Original languageEnglish
Pages (from-to)677-681
Number of pages5
JournalAdvanced Optical Materials
Volume4
Issue number5
DOIs
Publication statusPublished - 1 May 2016

Keywords

  • Dichroic photoinitiators
  • Liquid crystals
  • Lithography
  • Patterning
  • Polarization-selectivity

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