Abstract
The versatility of optical lithography can be expanded by using the polarization state of light as an additional parameter next to the intensity of light. This result is confirmed by exposing a highly polarization-selective photoreactive material with polarization holography which results in the formation of defined grating structures.
Original language | English |
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Pages (from-to) | 677-681 |
Number of pages | 5 |
Journal | Advanced Optical Materials |
Volume | 4 |
Issue number | 5 |
DOIs | |
Publication status | Published - 1 May 2016 |
Keywords
- Dichroic photoinitiators
- Liquid crystals
- Lithography
- Patterning
- Polarization-selectivity