Plasmonic light trapping for thin film A-SI:H solar cells

Vivian E. Ferry; Marc A. Verschuuren; Hongbo B.T. Li; Ewold Verhagen; Robert J. Walters; Ruud E.I. Schropp; Harry A. Atwater; Albert Polman

doi:10.1109/PVSC.2010.5617101

Plasmonic light trapping for thin film A-SI:H solar cells

Vivian E. Ferry, Marc A. Verschuuren, Hongbo B.T. Li, Ewold Verhagen, Robert J. Walters, Ruud E.I. Schropp, Harry A. Atwater, Albert Polman

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

4 Citations (Scopus)

Abstract

Here we discuss the design, fabrication, and simulation of ultrathin film n-i-p a-Si:H solar cells incorporating light trapping plasmonic back reflectors which exceed the performance of n-i-p cells on randomly textured Asahi substrates. The periodic patterns are made via an inexpensive and scalable nanoimprint method, and are structured directly into the metallic back contact. Compared to reference cells with randomly textured back contacts and flat back contacts, the patterned cells exhibit higher short-circuit current densities and improved overall efficiencies than either reference case. Angle-resolved photocurrent measurements confirm that the enhanced photocurrents are due to coupling to waveguide modes of the cell. Electromagnetic modeling is shown to agree well with measurements, and used to understand further details of the device.

Original language	English
Title of host publication	Program - 35th IEEE Photovoltaic Specialists Conference, PVSC 2010
Place of Publication	Piscataway
Publisher	Institute of Electrical and Electronics Engineers
Pages	760-765
Number of pages	6
ISBN (Electronic)	978-1-4244-5892-9
ISBN (Print)	978-1-4244-5890-5
DOIs	https://doi.org/10.1109/PVSC.2010.5617101
Publication status	Published - 20 Dec 2010
Externally published	Yes
Event	35th IEEE Photovoltaic Specialists Conference (PVSC 2010) - Honolulu, United States Duration: 20 Jun 2010 → 25 Jun 2010 Conference number: 35 https://www.ieee-pvsc.org/PVSC35/

Conference

Conference	35th IEEE Photovoltaic Specialists Conference (PVSC 2010)
Abbreviated title	PVSC 2010
Country/Territory	United States
City	Honolulu
Period	20/06/10 → 25/06/10
Internet address	https://www.ieee-pvsc.org/PVSC35/

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10.1109/PVSC.2010.5617101

Cite this

Ferry, V. E., Verschuuren, M. A., Li, H. B. T., Verhagen, E., Walters, R. J., Schropp, R. E. I., Atwater, H. A., & Polman, A. (2010). Plasmonic light trapping for thin film A-SI:H solar cells. In Program - 35th IEEE Photovoltaic Specialists Conference, PVSC 2010 (pp. 760-765). [5617101] Institute of Electrical and Electronics Engineers. https://doi.org/10.1109/PVSC.2010.5617101

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title = "Plasmonic light trapping for thin film A-SI:H solar cells",

abstract = "Here we discuss the design, fabrication, and simulation of ultrathin film n-i-p a-Si:H solar cells incorporating light trapping plasmonic back reflectors which exceed the performance of n-i-p cells on randomly textured Asahi substrates. The periodic patterns are made via an inexpensive and scalable nanoimprint method, and are structured directly into the metallic back contact. Compared to reference cells with randomly textured back contacts and flat back contacts, the patterned cells exhibit higher short-circuit current densities and improved overall efficiencies than either reference case. Angle-resolved photocurrent measurements confirm that the enhanced photocurrents are due to coupling to waveguide modes of the cell. Electromagnetic modeling is shown to agree well with measurements, and used to understand further details of the device.",

author = "Ferry, {Vivian E.} and Verschuuren, {Marc A.} and Li, {Hongbo B.T.} and Ewold Verhagen and Walters, {Robert J.} and Schropp, {Ruud E.I.} and Atwater, {Harry A.} and Albert Polman",

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publisher = "Institute of Electrical and Electronics Engineers",

address = "United States",

note = "35th IEEE Photovoltaic Specialists Conference (PVSC 2010), PVSC 2010 ; Conference date: 20-06-2010 Through 25-06-2010",

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Ferry, VE, Verschuuren, MA, Li, HBT, Verhagen, E, Walters, RJ, Schropp, REI, Atwater, HA & Polman, A 2010, Plasmonic light trapping for thin film A-SI:H solar cells. in Program - 35th IEEE Photovoltaic Specialists Conference, PVSC 2010., 5617101, Institute of Electrical and Electronics Engineers, Piscataway, pp. 760-765, 35th IEEE Photovoltaic Specialists Conference (PVSC 2010), Honolulu, Hawaii, United States, 20/06/10. https://doi.org/10.1109/PVSC.2010.5617101

Plasmonic light trapping for thin film A-SI:H solar cells. / Ferry, Vivian E.; Verschuuren, Marc A.; Li, Hongbo B.T.; Verhagen, Ewold; Walters, Robert J.; Schropp, Ruud E.I.; Atwater, Harry A.; Polman, Albert.

Program - 35th IEEE Photovoltaic Specialists Conference, PVSC 2010. Piscataway : Institute of Electrical and Electronics Engineers, 2010. p. 760-765 5617101.

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

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AU - Ferry, Vivian E.

AU - Verschuuren, Marc A.

AU - Li, Hongbo B.T.

AU - Verhagen, Ewold

AU - Walters, Robert J.

AU - Schropp, Ruud E.I.

AU - Atwater, Harry A.

AU - Polman, Albert

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N2 - Here we discuss the design, fabrication, and simulation of ultrathin film n-i-p a-Si:H solar cells incorporating light trapping plasmonic back reflectors which exceed the performance of n-i-p cells on randomly textured Asahi substrates. The periodic patterns are made via an inexpensive and scalable nanoimprint method, and are structured directly into the metallic back contact. Compared to reference cells with randomly textured back contacts and flat back contacts, the patterned cells exhibit higher short-circuit current densities and improved overall efficiencies than either reference case. Angle-resolved photocurrent measurements confirm that the enhanced photocurrents are due to coupling to waveguide modes of the cell. Electromagnetic modeling is shown to agree well with measurements, and used to understand further details of the device.

AB - Here we discuss the design, fabrication, and simulation of ultrathin film n-i-p a-Si:H solar cells incorporating light trapping plasmonic back reflectors which exceed the performance of n-i-p cells on randomly textured Asahi substrates. The periodic patterns are made via an inexpensive and scalable nanoimprint method, and are structured directly into the metallic back contact. Compared to reference cells with randomly textured back contacts and flat back contacts, the patterned cells exhibit higher short-circuit current densities and improved overall efficiencies than either reference case. Angle-resolved photocurrent measurements confirm that the enhanced photocurrents are due to coupling to waveguide modes of the cell. Electromagnetic modeling is shown to agree well with measurements, and used to understand further details of the device.

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ER -

Plasmonic light trapping for thin film A-SI:H solar cells

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