Plasma properties of a novel commercial plasma source for high-throughput processing of c-Si solar cells

P.J. Oever, van den, W.M.M. Kessels, B. Hoex, R.C.M. Bosch, A.J.M. van Erven, R.L.J.R. Pennings, W.T.M. Stals, M.D. Bijker, M.C.M. Sanden, van de

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

2 Citations (Scopus)

Abstract

A novel commercial plasma source for highthroughput processing of crystalline silicon solar cells is presented. In this paper, the plasma properties of this socalled Expanding Thermal Plasma (ETP) technique are addressed in detail and its application in an inline PECVD tool for uftrahigh-rate deposition of silicon nitride for antireflection coating purposes is described.
Original languageEnglish
Title of host publicationProceedings of the 31st Conference Record on Photovoltaic Specialists, 3-7 January 2005, Coronado Springs Resort, Lake Buena Vista, FL,USA
Pages1320-1323
Publication statusPublished - 2005

Publication series

NameConference Record of the IEEE Photovoltaic Specialists Conference
Volume31st
ISSN (Print)0160-8371

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