TY - GEN
T1 - Plasma properties of a novel commercial plasma source for high-throughput processing of c-Si solar cells
AU - Oever, van den, P.J.
AU - Kessels, W.M.M.
AU - Hoex, B.
AU - Bosch, R.C.M.
AU - van Erven, A.J.M.
AU - Pennings, R.L.J.R.
AU - Stals, W.T.M.
AU - Bijker, M.D.
AU - Sanden, van de, M.C.M.
PY - 2005
Y1 - 2005
N2 - A novel commercial plasma source for highthroughput processing of crystalline silicon solar cells is presented. In this paper, the plasma properties of this socalled Expanding Thermal Plasma (ETP) technique are addressed in detail and its application in an inline PECVD tool for uftrahigh-rate deposition of silicon nitride for antireflection coating purposes is described.
AB - A novel commercial plasma source for highthroughput processing of crystalline silicon solar cells is presented. In this paper, the plasma properties of this socalled Expanding Thermal Plasma (ETP) technique are addressed in detail and its application in an inline PECVD tool for uftrahigh-rate deposition of silicon nitride for antireflection coating purposes is described.
M3 - Conference contribution
SP - 1320
EP - 1323
BT - Proceedings of the 31st Conference Record on Photovoltaic Specialists, 3-7 January 2005, Coronado Springs Resort, Lake Buena Vista, FL,USA
ER -