Plasma processing: foreword: Plasma processing

K. Sasaki; E.V. Barnat; R. Engeln; S. Higashi; T. Ishijima; M. Ito; T. Ito; K. Kinoshita; K. Kurihara; T. Nakano; S. Nunomura; Y.K. Pu; O. Sakai; T. Sato

doi:10.7567/JJAP.54.01A001

Plasma processing: foreword: Plasma processing

K. Sasaki
, E.V. Barnat
, R. Engeln
, S. Higashi
, T. Ishijima
, M. Ito
, T. Ito
, K. Kinoshita
, K. Kurihara
, T. Nakano
, S. Nunomura
, Y.K. Pu
, O. Sakai
, T. Sato

Research output: Contribution to journal › Editorial › Academic › peer-review

Original language	English
Article number	01A001
Number of pages	1
Journal	Japanese Journal of Applied Physics
Volume	54
Issue number	1 Supplement
DOIs	https://doi.org/10.7567/JJAP.54.01A001
Publication status	Published - 1 Jan 2015
Event	8th International Conference on Reactive Plasmas/31st Symposium on Plasma Processing - Fukuoka, Japan Duration: 3 Feb 2014 → 7 Feb 2014

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10.7567/JJAP.54.01A001

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title = "Plasma processing: foreword: Plasma processing",

author = "K. Sasaki and E.V. Barnat and R. Engeln and S. Higashi and T. Ishijima and M. Ito and T. Ito and K. Kinoshita and K. Kurihara and T. Nakano and S. Nunomura and Y.K. Pu and O. Sakai and T. Sato",

year = "2015",

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doi = "10.7567/JJAP.54.01A001",

language = "English",

volume = "54",

journal = "Japanese Journal of Applied Physics",

issn = "0021-4922",

publisher = "Institute of Physics",

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note = "8th International Conference on Reactive Plasmas/31st Symposium on Plasma Processing, ICRP-8/SPP-31 ; Conference date: 03-02-2014 Through 07-02-2014",

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TY - JOUR

T1 - Plasma processing: foreword

T2 - 8th International Conference on Reactive Plasmas/31st Symposium on Plasma Processing

AU - Sasaki, K.

AU - Barnat, E.V.

AU - Engeln, R.

AU - Higashi, S.

AU - Ishijima, T.

AU - Ito, M.

AU - Ito, T.

AU - Kinoshita, K.

AU - Kurihara, K.

AU - Nakano, T.

AU - Nunomura, S.

AU - Pu, Y.K.

AU - Sakai, O.

AU - Sato, T.

PY - 2015/1/1

Y1 - 2015/1/1

UR - https://www.scopus.com/pages/publications/84920416579

U2 - 10.7567/JJAP.54.01A001

DO - 10.7567/JJAP.54.01A001

M3 - Editorial

AN - SCOPUS:84920416579

SN - 0021-4922

VL - 54

JO - Japanese Journal of Applied Physics

JF - Japanese Journal of Applied Physics

IS - 1 Supplement

M1 - 01A001

Y2 - 3 February 2014 through 7 February 2014

ER -

Plasma processing: foreword: Plasma processing

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