Abstract
A review. Plasma deposition and plasma conversion can be characterized by five steps: prodn. by ionization, transfer of chem. to precursors, transport of radicals to the surface, surface interactions with deposition, recirculation and generation of new monomers. For very fast deposition, large flows of radicals are needed and a regime is reached, in which monolayer coverage is reached in a very short time. [on SciFinder (R)]
| Original language | English |
|---|---|
| Pages (from-to) | 369-380 |
| Journal | Pure and Applied Chemistry |
| Volume | 74 |
| Issue number | 3 |
| DOIs | |
| Publication status | Published - 2002 |