Plasma processing and chemistry

Research output: Contribution to journalArticleAcademicpeer-review

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Abstract

A review. Plasma deposition and plasma conversion can be characterized by five steps: prodn. by ionization, transfer of chem. to precursors, transport of radicals to the surface, surface interactions with deposition, recirculation and generation of new monomers. For very fast deposition, large flows of radicals are needed and a regime is reached, in which monolayer coverage is reached in a very short time. [on SciFinder (R)]
Original languageEnglish
Pages (from-to)369-380
JournalPure and Applied Chemistry
Volume74
Issue number3
DOIs
Publication statusPublished - 2002

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