Plasma processes for atomic layer etching

Research output: Thesis › Phd Thesis 1 (Research TU/e / Graduation TU/e)

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Original language	English
Qualification	Doctor of Philosophy
Awarding Institution	Applied Physics and Science Education
Supervisors/Advisors	Mackus, Adrie J.M., Promotor Kessels, W.M.M. (Erwin), Promotor Knoops, Harm C.M., Copromotor
Award date	24 Jun 2024
Place of Publication	Eindhoven
Publisher	Eindhoven University of Technology
Print ISBNs	978-90-386-6064-6
Publication status	Published - 24 Jun 2024

Proefschrift. - Embargo. - pdf open access 24-06-2025.

Cite this

@phdthesis{d0fb8a2ed2e24e9bb14a2b958f1430e9,

title = "Plasma processes for atomic layer etching",

author = "Chittock, {Nicholas John}",

note = "Proefschrift. - Embargo. - pdf open access 24-06-2025.",

year = "2024",

month = jun,

day = "24",

language = "English",

isbn = "978-90-386-6064-6",

publisher = "Eindhoven University of Technology",

type = "Phd Thesis 1 (Research TU/e / Graduation TU/e)",

school = "Applied Physics and Science Education",

}