Plasma particle lofting

L.C.J. Heijmans, S. Nijdam

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

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Abstract

In plasma particle lofting, macroscopic particles are picked up from a surface by an electric force. This force originates from a plasma that charges both the surface and any particle on it, leading to an electric force that pushes particles off the surface. This process has been suggested as a novel cleaning technique in modern high-tech applications, because it has intrinsic advantages over more traditional methods. Its development is, however, limited by a lack of knowledge of the underlying physics. Although the lofting has been demonstrated before, there are neither numerical nor experimental quantitative measures of it. Especially determining the charge deposited by a plasma on a particle on a surface proves difficult. We have developed a novel experimental method using a "probe force.'' This allows us to, for the first time, quantitatively measure the plasma lofting force. By applying this method to different plasma conditions we can identify the important plasma parameters, allowing us to tailor a plasma for specific cleaning applications. Additionally, the quantitative result can help in the development of new models for the electron and ion currents through a plasma sheath.
Original languageEnglish
Title of host publication68th Annual Gaseous Electronics Conference/9th International Conference on Reactive Plasmas/33rd Symposium on Plasma Processing, 12-16 October 2015, Honolulu, Hawaii
PublisherAmerican Physical Society
Number of pages1
Publication statusPublished - 12 Oct 2015
Event68th Annual Gaseous Electronics Conference/9th International Conference on Reactive Plasmas/33rd Symposium on Plasma Processing - Honolulu, Hawaii, United States
Duration: 12 Oct 201512 Oct 2015

Publication series

NameBulletin of the American Physical Society
PublisherAPS
Number9
Volume60

Conference

Conference68th Annual Gaseous Electronics Conference/9th International Conference on Reactive Plasmas/33rd Symposium on Plasma Processing
Country/TerritoryUnited States
CityHonolulu, Hawaii
Period12/10/1512/10/15

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